Bragg refractive waveguide edge transmitting semiconductor laser with low horizontal divergence angle
A technology of Bragg reflection and divergence angle, which is applied to the structure of optical waveguide semiconductors, etc., can solve the problems of complex far-field patterns, epitaxial growth, preparation process, demanding working current and temperature, narrow lateral far-field divergence angle, etc., to achieve Improve the effect of catastrophic damage on the end face, stable single transverse mode operation, and large gain and loss difference
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Embodiment 1
[0047] Such as Figure 3(a) , 3(b) , 3(c) is a schematic diagram of the refractive index distribution, fundamental transverse mode near-field and far-field distribution of a symmetrical low lateral divergence Bragg reflective waveguide edge-emitting semiconductor laser (wavelength 980nm). Its N-plane and P-plane waveguides both use 6 pairs of Al 0.1 Ga 0.9 As / Al 0.3 Ga 0.7 As periodic waveguide, the arrangement period T of the high and low refractive index layers of the lower waveguide layer 4 N The high and low refractive index layers of the upper waveguide layer 6 are arranged with a period T P Equal, the material and thickness of the high and low refractive index layers in each cycle of the upper waveguide layer 6 and the lower waveguide layer 4 are respectively the same. The active area is located in the center of the central cavity, using In 0.2 Ga 0.8 As / GaAs double quantum wells (QWs). As can be seen from the near-field distribution of the fundamental mode in F...
Embodiment 2
[0049] Such as Figure 4(a) , 4(b) , 4(c) is a schematic diagram of the refractive index distribution, the near-field and far-field distribution of the fundamental transverse mode of an asymmetric low lateral divergence Bragg reflective waveguide edge-emitting semiconductor laser (wavelength is 980nm), and its N surface and P-plane waveguides respectively use 8 pairs and 4 pairs of Al 0.1 Ga 0.9 As / Al 0.3 Ga 0.7 As periodic waveguide; the material and thickness of the high and low refractive index layers in each period of the lower waveguide layer 4 and the upper waveguide layer 6 are the same, but the period logarithm of the upper waveguide layer 6 is smaller than that of the lower waveguide layer 4 . The active area uses In 0.2 Ga 0.8 As / GaAs double quantum wells (QWs). In the figure, 4(a) is the refractive index distribution, 4(b) and 4(c) are the transverse near-field distribution and far-field distribution of the fundamental transverse mode, respectively. It can b...
Embodiment 3
[0051] Such as Figure 5 As shown, it is a schematic diagram of the refractive index distribution of an asymmetric low lateral divergence Bragg reflective waveguide edge-emitting semiconductor laser, the high refractive index layer 4b in its lower waveguide layer 4 and the high refractive index layer in the upper waveguide layer 6 6a. The material and thickness of the low refractive index layer 4a in the lower waveguide layer 4 and the low refractive index layer 6b in the upper waveguide layer 6 are not exactly the same, and the period logarithms in the two waveguide layers can be the same or different . The central cavity 5 is located between the lower waveguide layer 4 and the upper waveguide layer 6, and is a defect layer common to the two photonic crystals. Its refractive index and thickness are not exactly the same as those of any layer in the period of the lower waveguide 4 and the upper waveguide 6. The defect layer is designed so that the lateral transmission constant...
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