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Production method of polymide

A technology of polyimide and manufacturing method, applied in the field of polyimide manufacturing, can solve the problems of polyimide washing off, poor water resistance of polyimide, etc., and achieve the effect of sufficient chemical reaction

Active Publication Date: 2013-06-12
SHENZHEN DALTON ELECTRONICS MATERIAL CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] In the process of making LCD screens, the glass coated with polyimide needs to be washed with water after the rubbing alignment process, which will cause ordinary polyimide or polyimide with poor water resistance to be washed. Lose

Method used

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  • Production method of polymide

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Embodiment Construction

[0018] The present invention proposes a washing-resistant polyimide manufacturing method, which is described in detail as follows.

[0019] Described polyimide manufacture method embodiment comprises the steps:

[0020] S1: Take dimethylformamide (DMF) and dissolve 4,4-diaminodiphenyl ether (ODA) with a molar mass percentage of 60%-70% of the total amines, and keep the solution temperature stable at 10-25°C;

[0021] S2: adding pyromellitic dianhydride (PMDA) accounting for 10%-30% of the total anhydride molar mass percentage to the solution at least twice, with an interval of at least 2 hours each time;

[0022] S3: After adding pyromellitic dianhydride (PMDA), add 3,3',5,5'-tetraethyl-4,4'-di Aminodiphenylmethane (3,5-TEMDA) reacted;

[0023] S4: After adding 3,3',5,5'-tetraethyl-4,4'-diaminodiphenylmethane (3,5-TEMDA) in the previous step for at least 2 hours, the concentration of the total anhydride mass percentage is 10%-15% of perfluoro-1,4-diphthalic anhydride benzen...

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Abstract

The invention relates to a production method of polymide. The method comprises the following steps: dissolving ODA which accounts for 60%-70% by molar mass of total amine in DMF (dimethyl formamide), maintaining the temperature of a solution at 10-25 DEG C stably; adding PMDA (pyromellitic dianhydride) which accounts for 10%-30% by molar mass of total anhydride in the solution at least twice at an interval of at least 2 hours each time; after adding PMDA, adding 3,5-TEMDA which accounts for 20%-25% by molar mass of total amine for reacting; and after adding 3,5-TEMDA for at least 2 hours in the former step, adding 10 FEDA which accounts for 10%-15% by molar mass of total anhydride and PMDA which accounts for 5%-15% by molar mass of total anhydride, reacting for at least 2 hours, and then adding TAPOB to react for at least 2 hours, and carrying out molecular weight regulation by adding FEDA which accounts for about 10%-15% by molar mass of total amine. By using the production method ofpolymide, the reaction is sufficient, and the product is washing resistant.

Description

technical field [0001] The invention relates to a manufacturing method, in particular to a polyimide manufacturing method. Background technique [0002] Polyimide is a high-performance polymer containing imide five-membered rings in its structure, which has excellent heat resistance, good mechanical properties, chemical corrosion resistance and excellent dielectric properties. It is widely used in high-tech fields such as aerospace and microelectronics. It is especially used in the production of alignment films for liquid crystal displays, half-wave plates for planar light-wave circuit boards, etc. [0003] In the process of making LCD screens, the glass coated with polyimide needs to be washed with water after the rubbing alignment process, which will cause ordinary polyimide or polyimide with poor water resistance to be washed. Lose. Therefore, increasing the degree of cross-linking of polyimide to a certain extent can not only ensure the flexibility of polyimide but al...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08G73/10
Inventor 石孟阳李世清
Owner SHENZHEN DALTON ELECTRONICS MATERIAL CO LTD
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