Thermal field device
A technology of thermal field and thermal insulation layer, which is applied in post-processing devices, crystal growth, post-treatment, etc., can solve the problems of lower crystal quality, inability to remove impurities, and high crystal impurity concentration
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[0044] The present invention is also a crystal growth furnace for manufacturing silicon crystals, such as figure 2 As shown, it is mainly based on a crucible 31 for containing silicon molten soup 41, and a heat insulating layer 32 is provided on the periphery of the crucible 31 to form a sealed thermal field, and a heater 37 is provided in the thermal field for Silicon metal is heated.
[0045] The heat field device of the present invention is provided with a gas delivery pipe 33 that can relatively extend into the crucible 31 at a position above the heat insulating layer 32 relative to the crucible 31 for connecting inert gas, and the heat insulating layer 32 is provided with a predetermined number of exhaust gas The holes 34 are used to cooperate with the gas with a predetermined flow rate input from the gas delivery pipe 33, so as to generate an air flow passing through the thermal field, so as to discharge the oxides that are easy to form impurities; of course, a cover pl...
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