Device and method for clearing dust generated by laser graduating

Abstract

The invention discloses a device for clearing dust generated by laser graduating. The device comprises a processing unit, a dust collecting device, a first filtering unit, a high-pressure exhaust fan and a plurality of electrostatic dust collecting bars, wherein the processing unit comprises an inner cavity and a workbench; the workbench is arranged in the inner cavity; the dust collecting device is provided with a dust inlet and a dust outlet; the dust inlet is positioned under the workbench; the dust outlet of the dust collecting device is communicated with the upper end of the first filtering unit; the lower end of the first filtering unit is communicated with the suction opening of the high-pressure exhaust fan; a first filter screen core is arranged between the upper end and the lower end of the first filtering unit; the air outlet of the high-pressure exhaust fan is communicated with the inner cavity; and the electrostatic dust collecting bars are arranged uniformly on a laser generator. Equipment for clearing dust generated by laser graduating disclosed by the invention has high dust collecting efficiency, low noise and low energy consumption. The invention further discloses a method for clearing dust generated by laser graduating.

Description

technical field [0001] The invention relates to a dust removal device, in particular to a device and method for removing dust generated by laser marking. Background technique [0002] In the process of solar panel preparation, especially in the process of amorphous silicon solar cell panel preparation, each evaporation (or sputtering, or coating) film layer needs to be laser scribed with a laser generator. During the process of marking, a large amount of electrostatically charged or uncharged dust will be generated and adsorbed or deposited on the marking groove and plate. The above-mentioned dust will be covered during the process of film coating), which will cause a short circuit on the circuit layout on the board; at the same time, the dust deposited on the glass surface will also affect the thickness and uniformity of the film in the next evaporation process, thereby reducing the thickness of the entire board. photoelectric conversion rate. [0003] At present, the met...

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Problems solved by technology

[0004] Although the above-mentioned first method of drainage in a closed environment with a high-power exhaust fan can suck away the dust without static electricity, it cannot completely suck away the dust with static electricity adsorbed on the surface of the film and in the wire groove, and the dust removal efficiency is low. On the one hand, it is difficult to form a large enclosed space to generate sufficient airflow; on the other hand, it is necessary to introduce a high-power exhaust fan to realize the dust removal function, and a high-power exhaust fan will cause greater noise pollution and increase energy consumption

[0005] Using the above-mentioned second full-coverage air collection box dust removal method, since the wind direction inlet is set above the amorphous silicon solar panel, it is also necessary to introduce a high-power exhaust fan; The dust removal method of the full-coverage wind box can only absorb the dust in the line space, but cannot absorb the dust adsorbed on the surface of the film and the wire groove due to static electricity, resulting in incomplete dust removal , leading to low dust removal efficiency

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