Cracking process of organosilicon high-boiling components
An organosilicon, high-boiling technology, which is applied in the technical field of organosilicon high-boiling cracking, can solve problems such as poor catalytic effect, high production cost, and inability to solve material waste.
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Embodiment 1
[0014] Preparation process: React 100Kg organic silicon high boilers in 190°C reactor A for 1 hour to remove high-boiling silicon powder and metal impurities; the removed organic silicon high boilers pass through the pipeline and enter the heated hydrogen chloride Gas reaction kettle B, reacts with the catalyst, the temperature in the kettle is controlled at 130°C, the stirring speed is 200r / min, and the reaction is 3.5h; the high boiler after catalytic cracking passes through the hierarchical cooling tower, and the dimethylform is separated at the 71°C split port Dichlorosilane, monomethyltrichlorosilane was separated at the split port at 65°C, monomethylhydrodichlorosilane was separated at the split port at 41°C, and trimethylchlorosilane was separated at the split port at 56°C.
[0015] Among them, organosilicon high boiler: hydrogen chloride = 5:1.
[0016] Among them, the catalyst is a mixture of N,N-dimethylaniline, N,N-diethylformamide, and tri-n-butylamine, and the tot...
Embodiment 2
[0019] Preparation process: React 100Kg organic silicon high boilers in 195°C reaction kettle A for 1 hour to remove high boiling point silicon powder and metal impurities; the removed organic silicon high boilers pass through the pipeline and enter the heated hydrogen chloride Gas reaction kettle B, react with the catalyst, the temperature in the kettle is controlled within 140°C, the stirring speed is 220r / min, and the reaction is 4h; the high boilers after catalytic cracking pass through the hierarchical cooling tower, and the dimethylformamide is separated at the split port at 71°C Dichlorosilane, monomethyltrichlorosilane was separated at the split port at 65°C, monomethylhydrodichlorosilane was separated at the split port at 41°C, and trimethylchlorosilane was separated at the split port at 56°C.
[0020] Among them, organosilicon high boiler: hydrogen chloride = 5:1.
[0021] Among them, the catalyst is a mixture of N,N-dimethylaniline, N,N-diethylformamide, and tri-n-b...
Embodiment 3
[0024] Preparation process: React 100Kg organic silicon high boilers in 185°C reactor A for 1 hour to remove high-boiling silicon powder and metal impurities; the organic silicon high boilers after the removal of impurities pass through the pipeline and enter the heated hydrogen chloride Gas reaction kettle B, react with the catalyst, the temperature in the kettle is controlled within 120°C, the stirring speed is 180r / min, and the reaction is 3h; the high boilers after catalytic cracking pass through the hierarchical cooling tower, and the dimethylformamide is separated at the split port at 71°C Dichlorosilane, monomethyltrichlorosilane was separated at the split port at 65°C, monomethylhydrodichlorosilane was separated at the split port at 41°C, and trimethylchlorosilane was separated at the split port at 56°C.
[0025] Among them, organosilicon high boiler: hydrogen chloride = 5:1.
[0026] Among them, the catalyst is a mixture of N,N-dimethylaniline, N,N-diethylformamide, a...
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