Microstructure for detecting mechanical properties of one-dimensional nanometer materials
A nano-material and micro-structure technology, applied in the field of micro-mechanical technology and nano-material science, can solve the problems that the load of the sample and the deformation of the sample cannot be measured separately at the same time, the calculation error is large, and the implementation cost is high, so as to achieve intuitive measurement and reduce the impact , to ensure the effect of accuracy
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[0039] Below in conjunction with accompanying drawing 3 further illustrate the preparation process of the present invention.
[0040] Referring to Figure 3(a), 01 is the device layer, the material is polysilicon, and the thickness is about 10 μm; 02 is the sacrificial layer, the material is silicon oxide; 03 is the silicon substrate; 04 is the protective layer; 05 is the primary photoresist; secondary photoresist.
[0041] Referring to FIG. 3( b ), a layer of photoresist 05 is coated on the surface of the device layer.
[0042] Referring to FIG. 3(c), the photoresist is etched to form a micromechanical structure pattern.
[0043] Referring to FIG. 3( d ), the device layer is etched to form a micromechanical structure.
[0044] Referring to FIG. 3( e ), the photoresist is removed.
[0045]Referring to FIG. 3( f ), a photoresist 06 is coated on the etched device layer and the surface of the protective layer.
[0046] Referring to FIG. 3(g), the photoresist of the protective ...
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