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Optical processing system and method
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An optical processing and processing technology, which is applied in the direction of microlithography exposure equipment, photolithography exposure device, etc., can solve the problems of inaccurate gray scale and graphic size, and the inability to use photolithography technology, etc., to achieve processing efficiency and positioning high precision effect
Active Publication Date: 2012-08-01
SUZHOU UNIV +2
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Problems solved by technology
This method is called 'dither' grayscale dithering in image processing. Its grayscale and graphic size are not accurate. It can only be used in the field of printing and packaging, and cannot be used in precise photolithography.
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Embodiment 1
[0085] ginseng Figure 4 As shown, the block size on the spatial light modulator 13 is 48 pixels, a one-dimensional periodic black and white image is used, the period is 8 pixels, and the duty ratio of the image in the block is 2 / 8.
[0086] Among them, a1 is the image input in the block, and the duty ratio of the image is 2 / 8; a2 is the image filtered on the spectrum plane, the low frequency in the middle of the spectrum is retained, and the high frequency is filtered out; a3 is the final exposed image.
Embodiment 2
[0088] ginseng Figure 5 As shown, the block size on the spatial light modulator 13 is 48 pixels, a one-dimensional periodic black and white image is used, the period is 8 pixels, and the duty ratio of the image in the block is 4 / 8.
[0089] Among them, b1 is the image input in the block, and the duty ratio of the image is 4 / 8; b2 is the image filtered on the spectrum surface, the low frequency in the middle of the spectrum is retained, and the high frequency is filtered out; b3 is the final exposed image.
Embodiment 3
[0091] ginseng Image 6 As shown, the figure shows four tiles of a 2D periodic structure with duty cycles of 0.25, 0.5, 0.75, and 1, respectively. Each block on the spatial light modulator 13 has a size of 32 pixels, and adopts a two-dimensional periodic black and white image with a period of 2 pixels.
[0092] ginseng Figure 7 shown, for Image 6 The design graphics in use the grayscale exposure effect of fully coherent light (stereo, to achieve grayscales of 0.25, 0.5, 0.75 and 1.
[0093] ginseng Figure 8 shown, for Image 6 The design graphics in are using a grayscale exposure effect (flat) of fully coherent light.
[0094] ginseng Figure 9 shown, for Image 6 The design graphics in use the grayscale exposure effect (stereo) of partially coherent light to achieve grayscales of 0.25, 0.5, 0.75 and 1.
[0095] ginseng Figure 10 shown, for Image 6 The design graphics in use the gray scale exposure effect (flat) of partially coherent light.
[0096] To sum up, ...
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Abstract
The invention discloses an optical processingsystem, which comprises a processing platform, a spatial light modulator and a projection optical system, wherein the processing platform is used for realizing the step motion of a first motion shaft and the scanning motion of a second motion shaft; the spatial light modulator is used for producing graphics patterns; and the projection optical system comprises a first lens group, a second lens group and a filter. The filter is arranged between the first lens group and the second lens group and is positioned on a spectrum surface of the first lens group. The gray scale realized by the optical processing system and method disclosed by the invention is independent of time of exposure and exposure times, and the accurate gray scale can be realized in the short time of exposure and under the condition of single exposure, so that the optical processing system is completely applied to a flight exposure processing mode. The processing efficiency and the positioning accuracy are high.
Description
technical field [0001] The invention belongs to the field of maskless photolithography, and in particular relates to an optical processing system and a processing method. Background technique [0002] Maskless lithography, also known as laserdirect writing, is more flexible and convenient than traditional mask exposure lithography. Especially in the production of large-area precision graphics, maskless lithography has obvious advantages in terms of processing efficiency, dimensional accuracy and pattern uniformity compared with masklithography and other stencil splicing methods. The production of large-area precision graphics is the basis of industrial production. [0003] Maskless lithography has been widely used in many fields such as optical thin film, semiconductorchiplithography, MOEMS (micro-opto-electromechanical system), printing plate making, light-curing rapid prototyping, genechip, etc., and has gradually become an important part of high-precision optical pr...
Claims
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