TFT array substrate and manufacturing method thereof and display device
A technology of an array substrate and a manufacturing method, which is applied in the fields of a TFT array substrate and a manufacturing method thereof and a display device, can solve the problems of complicated process flow, increase in thickness of the substrate, etc., and achieve the effects of simplifying the process flow, changing the thickness, and thinning the thickness.
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[0034] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0035] The TFT array substrate manufacturing method provided by the embodiment of the present invention, such as figure 1 As shown, the steps include:
[0036] S101 , depositing a metal layer on the substrate, and obtaining gate lines and gates through a first patterning process.
[0037] Such as figure 2 As shown, a magnetron sputtering method can be used to prepare a layer with a thickness of to metal film layer. The metal material can usually be met...
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