Apparatus and methods for cyclical oxidation and etching
An equipment, etching technology, applied in the field of device equipment, which can solve the problems of shrinking size limitation, increasing noise, impossible NAND devices, etc.
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[0033] An apparatus and method are described herein for oxidizing a surface of a material layer of a semiconductor device to form an oxide layer and removing at least a portion of the oxide layer by etching in a single chamber. The present invention is not limited to a particular device, however the described apparatus and methods may be used to fabricate semiconductor devices and structures suitable for narrow pitch applications. As used herein, narrow pitch applications include half pitches of 32 nm or less (eg, device nodes of 32 nm or less). The term "pitch" as used herein refers to a measurement between parallel structures or adjacent structures of a semiconductor device. The spacing may be measured from side to side on the same side of adjacent structures or substantially parallel structures. Of course, the semiconductor devices and structures can also be used in applications with larger pitches. The semiconductor device can be, for example, a NAND or NOR flash memory,...
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