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Apparatus and methods for cyclical oxidation and etching

An equipment, etching technology, applied in the field of device equipment, which can solve the problems of shrinking size limitation, increasing noise, impossible NAND devices, etc.

Inactive Publication Date: 2012-11-21
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Unfortunately, as the device node becomes small enough that the capacitive coupling between the floating gate and the control gate becomes too small to effectively operate the device at allowable operating voltages, shrinking size is limited
Additionally, the parasitic capacitance (i.e., noise) between adjacent floating gates increases beyond the limits of system controller read errors in NAND memory devices
Therefore, it is impossible to have a functional NAND device under this condition

Method used

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  • Apparatus and methods for cyclical oxidation and etching
  • Apparatus and methods for cyclical oxidation and etching
  • Apparatus and methods for cyclical oxidation and etching

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Embodiment Construction

[0033] An apparatus and method are described herein for oxidizing a surface of a material layer of a semiconductor device to form an oxide layer and removing at least a portion of the oxide layer by etching in a single chamber. The present invention is not limited to a particular device, however the described apparatus and methods may be used to fabricate semiconductor devices and structures suitable for narrow pitch applications. As used herein, narrow pitch applications include half pitches of 32 nm or less (eg, device nodes of 32 nm or less). The term "pitch" as used herein refers to a measurement between parallel structures or adjacent structures of a semiconductor device. The spacing may be measured from side to side on the same side of adjacent structures or substantially parallel structures. Of course, the semiconductor devices and structures can also be used in applications with larger pitches. The semiconductor device can be, for example, a NAND or NOR flash memory,...

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Abstract

Apparatus and methods for the manufacture of semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof are described herein. Disclosed are various single chambers configured to form and / or shape a material layer by oxidizing a surface of a material layer to form an oxide layer; removing at least some of the oxide layer by an etching process; and cyclically repeating the oxidizing and removing processes until the material layer is formed to a desired shape. In some embodiments, the material layer may be a floating gate of a semiconductor device.

Description

technical field [0001] Embodiments of the present invention generally relate to the field of semiconductor manufacturing processes and semiconductor devices, and more particularly, to apparatus and methods for manufacturing devices suitable for narrow pitch applications. Background technique [0002] Shrinking semiconductor devices by simply shrinking the device structure often fails to produce acceptably small-scale structures. For example, in NAND flash memory devices, when the floating gate is scaled down, the capacitive coupling (eg, sidewall capacitance) of the floating gate is therefore scaled down with the surface area of ​​the floating gate. Thus, the smaller the surface area of ​​the floating gate, the smaller the capacitive coupling between the floating gate and, for example, the control gate. In general, the choice of sacrificing capacitive coupling for size reduction is acceptable as long as the NAND memory device remains operational. Unfortunately, scaling Si...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/3065H10B41/30H10B69/00
CPCH01L21/67109H01L21/67207H01L21/6719H01L27/11521H01L21/67167H01L21/68785H01L21/67115H01L21/0223H01L21/76232H10B41/30H01L21/0228H01L21/30655H01L21/67098
Inventor 乌陀衍·甘古利横田义孝克里斯托弗·S·奥尔森马修·D·斯科特奈伊-卡斯特维基·阮斯瓦米纳坦·斯里尼瓦桑刘伟约翰内斯·F·斯温伯格乔斯·A·马林阿吉特·巴拉克里斯南雅各布·纽曼斯特芬·C·希克森
Owner APPLIED MATERIALS INC
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