Transparent conductive film glass and preparation method thereof
A transparent conductive film and glass technology, applied in chemical instruments and methods, glass/slag layered products, circuits, etc., can solve the problem that the film can not be taken into account, the transmittance is low in resistivity, and the TCO glass is transparent. problems such as low overflow rate, to achieve the effect of compact structure, good adhesion and dense structure
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[0023] The embodiment of the present invention also provides the above-mentioned transparent conductive film glass preparation method, the process flow chart of the method is as follows figure 2 shown, see also figure 1 , the method includes the following steps:
[0024] S1: Obtain the glass substrate 1;
[0025] S2: coating the glass substrate 1 with multiple layers of anti-reflection coatings 2 in sequence;
[0026] S3: Coating a transparent conductive film layer 3 on the surface of the anti-reflection film layer 2 opposite to the glass substrate 1 to obtain the transparent conductive film glass.
[0027] Specifically, the step S1 of the above-mentioned transparent conductive film glass preparation method preferably includes pre-treatment of the glass substrate 1 . The pre-treatment may include cleaning with chemical reagents, ultrasonic cleaning, water cleaning, etc. After cleaning, dry it in an infrared oven to eliminate static electricity before use. The pre-treatmen...
Embodiment 1
[0035] A kind of transparent conductive film glass, its structure is as figure 1 As shown, it includes ultra-white original glass substrate 1, the first TiO2 Film layer 21, the first SiO 2 Film layer 22, the second TiO 2 Film layer 23, the second SiO 2 film layer 24 and AZO film layer 3. Among them, the first TiO 2 The thickness of the film layer 21 is 50nm, the first SiO 2 The thickness of the film layer 22 is 70nm, the second TiO 2 The thickness of the film layer 23 is 50nm, the second SiO 2 The thickness of the film layer 24 is 70nm and the thickness of the AZO film layer 3 is 1000nm.
[0036] Its preparation method is as follows:
[0037] S11: Choose fresh ultra-white original glass substrate 1, a total of 5 pieces, the edges are ground, cleaned by a washing machine and blown dry by an air knife, the static electricity is eliminated by a non-contact static elimination rod, and enter the vacuum magnetic control through the automatic transmission of the loading table ...
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