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Europium-doped yttrium oxide sulfide luminescent film, preparation method thereof, and organic electroluminescent device

A technology of light-emitting thin film and yttrium oxysulfide, which is used in electric solid-state devices, chemical instruments and methods, light-emitting materials, etc.

Inactive Publication Date: 2012-12-26
OCEANS KING LIGHTING SCI&TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the preparation of europium-doped yttrium oxysulfide light-emitting materials into thin films of electroluminescent devices has not been reported yet.

Method used

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  • Europium-doped yttrium oxide sulfide luminescent film, preparation method thereof, and organic electroluminescent device
  • Europium-doped yttrium oxide sulfide luminescent film, preparation method thereof, and organic electroluminescent device
  • Europium-doped yttrium oxide sulfide luminescent film, preparation method thereof, and organic electroluminescent device

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preparation example Construction

[0018] Step S1, preparation of ceramic target material: according to the general chemical formula Y 2 o 2 S:xEu +3 The stoichiometric ratio of each element, choose Y 2 o 3 , Eu 2 o 3 and S (that is, sulfur) powder, after being uniformly mixed, sintered at 900-1300°C (preferably 1050°C), cooled naturally to obtain a target sample, and cut the target sample into a target with a diameter of 50mm and a thickness of 2mm material; wherein, the value range of x is 0.0006~0.0196; the preferred value of x is 0.0033;

[0019] Step S2, put the target and substrate in step S1 into the vacuum chamber of the magnetron sputtering coating equipment, and use a mechanical pump and a molecular pump to pump the vacuum of the chamber to 1.0×10 -3 Pa~1.0×10 -5 Pa, preferably 5.0×10 -4 Pa;

[0020] Step S3, adjusting the magnetron sputtering coating process parameters as follows: the base-target distance is 45-90mm, preferably 60mm; the substrate temperature is 250°C-750°C, preferably 500°C...

Embodiment 1

[0026] 1. Select Y with a purity of 99.99% 2 o 3 , S and Eu 2 o 3 powder (wherein, Y 2 o 3 The mass of S is 173g, the mass of S is 26g, the mass of Eu 2 o 3 The mass is 1g), after uniform mixing, sintering at 1050°C, and natural cooling to obtain a target sample, which is cut into a target with a diameter of 50mm and a thickness of 2mm;

[0027] 2. Put the target into the vacuum chamber of the magnetron sputtering coating equipment;

[0028] 3. Clean the glass ultrasonically with acetone, absolute ethanol and deionized water successively, and perform oxygen plasma treatment on it, and then put it into the vacuum chamber of the magnetron sputtering coating equipment; among them, the distance between the target and the glass Set to 60mm;

[0029] 4. Use a mechanical pump and a molecular pump to pump the vacuum of the vacuum chamber of the magnetron sputtering coating equipment to 5.0×10 -4 Pa;

[0030]5. Adjust the process parameters of magnetron sputtering coating: th...

Embodiment 2

[0033] 1. Choose Y with a purity of 99.99% 2 o 3 , S and Eu 2 o 3 powder (wherein, Y 2 o 3 The mass of S is 179.98g, the mass of S is 20g, and the mass of Eu 2 o 3 The mass is 0.02g), after being uniformly mixed, sintered at 900°C, cooled naturally to obtain a target sample, and cut the target sample into a target with a diameter of 50mm and a thickness of 2mm;

[0034] 2. Put the target into the vacuum chamber of the magnetron sputtering coating equipment;

[0035] 3. Clean the glass ultrasonically with acetone, absolute ethanol and deionized water successively, and perform oxygen plasma treatment on it, and then put it into the vacuum chamber of the magnetron sputtering coating equipment; among them, the distance between the target and the glass Set to 45mm;

[0036] 4. Use a mechanical pump and a molecular pump to pump the vacuum of the vacuum chamber of the magnetron sputtering coating equipment to 1.0×10 -3 Pa;

[0037] 5. Adjust the process parameters of magnet...

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Abstract

The invention belongs to the field of luminescent materials, and discloses a europium-doped yttrium oxide sulfide luminescent film, a preparation method thereof, and an organic electroluminescent device. The luminescent film has a chemical general formula of Y2O2S:xEu<+3>, wherein Y2O2S is a substrate, Eu is a doped element, and x ranges from 0.0006 to 0.0196. According to the invention, a magnetron sputtering equipment is adopted for preparing the europium-doped yttrium oxide sulfide luminescent film. The film has strong luminescence peak in a 620nm wavelength region, and is a development material of electroluminescent devices.

Description

technical field [0001] The invention relates to the field of luminescent materials, in particular to a europium-doped yttrium oxysulfide luminescent thin film and a preparation method thereof. The invention also relates to an organic electroluminescent device using the europium-doped yttrium oxysulfide light-emitting thin film as a light-emitting layer. Background technique [0002] Compared with the display screen made of traditional luminescent powder, the luminescent film shows strong advantages in terms of contrast, resolution, heat conduction, uniformity, adhesion to the substrate, and outgassing rate. Therefore, as functional materials, luminescent thin films have broad application prospects in flat panel displays such as cathode ray tubes (CRTs), electroluminescence displays (ELDs) and field emission displays (FEDs). [0003] In the research of LED phosphors, the excitation spectrum of rare earth-doped yttrium oxysulfide phosphors can better match the emission spectr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K11/84H01L51/54
Inventor 周明杰王平陈吉星黄辉
Owner OCEANS KING LIGHTING SCI&TECH CO LTD
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