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X-Y micro-adjustment apparatus for optical element in lithographic projection objective

A technology of lithography projection and adjustment device, which is applied in the direction of optical components, microlithography exposure equipment, photolithography exposure device, etc.

Inactive Publication Date: 2013-01-02
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0004] In order to solve the problem of X-Y high-precision adjustment of optical elements in the lithography projection objective lens, the present invention proposes an optical element X-Y flexible micro-adjustment device, which is especially suitable for the micro-adjustment of the optical lens in the deep ultraviolet projection objective lens

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  • X-Y micro-adjustment apparatus for optical element in lithographic projection objective
  • X-Y micro-adjustment apparatus for optical element in lithographic projection objective
  • X-Y micro-adjustment apparatus for optical element in lithographic projection objective

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Embodiment Construction

[0018] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0019] like Figure 1 to Figure 5 As shown, the optical element X-Y micro-adjustment device in the lithography projection objective lens includes a mirror frame 2, two drivers 3 and two capacitive sensors 4; the optical element 1 and the mirror frame 2 are connected by gluing, and the two drivers 3 and two capacitive sensors 4 are fixed on the mirror frame 2 respectively.

[0020] The picture frame 2 is an integrated structure composed of a picture frame inner ring 2-1, a picture frame outer ring 2-2, a straight elastic piece 2-3, a folding elastic piece 2-4, a folding elastic piece 2-5 and a plurality of auxiliary supporting elastic pieces 2-6. Processed by slow wire cutting or electrochemical corrosion. The inner ring 2-1 of the picture frame and the outer ring 2-2 of the picture frame are connected by a straight elastic piece 2-3, a first...

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Abstract

An X-Y micro-adjustment apparatus for an optical element in a lithographic projection objective belongs to the deep-ultraviolet projection lithography objective structure design and aberration compensation fields. To solve the X-Y high-precision adjustment problem of the optical element in the lithographic projection objective, the apparatus comprises an objective frame, two drivers and two capacitance sensors, wherein the two drivers and the two capacitance sensors are respectively fixed on the objective frame; the drivers are arranged outside the outer ring of the objective frame; the input displacements of the drivers act on a first folding shrapnel and a second folding shrapnel; the input displacement directions are vertical to the outside shrapnel of the first folding shrapnel and the outside shrapnel of the second folding shrapnel respectively; each of the two capacitance sensors is a single-electrode capacitance sensor and is fixed at the inner side of the outer ring of the objective frame; and the circumferential interval between the two capacitance sensors is 90DEG, so the X-Y micro-adjustment of the optical element is realized.

Description

technical field [0001] The invention belongs to the field of structure design and aberration compensation of deep ultraviolet projection lithography objective lens, and specifically relates to an X-Y micro-motion adjustment device for optical elements in lithography projection objective lens. Background technique [0002] Projection lithography equipment is the key equipment in the manufacturing process of large-scale integrated circuits. In recent years, with the continuous improvement of the fineness of the line width of integrated circuits, the resolution of projection optical equipment has gradually improved. At present, the ArF excimer laser with a wavelength of 193.368nm Lithography equipment has become the mainstream equipment for integrated circuit manufacturing at 90nm, 65nm and 45nm nodes. [0003] During the installation, adjustment and use of the projection lithography objective lens, in order to meet the good optical performance of the objective lens, it is nece...

Claims

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Application Information

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IPC IPC(8): G03F7/20G02B7/02
Inventor 赵磊巩岩于新峰
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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