Transparent electrode manufacturing method, mask plate and equipment

Abstract

A transparent electrode fabricating method and a mask plate. The method comprises the following steps: forming a film on a glass substrate and coating the film with a photoresist (S201); exposing the photoresist through the mask plate, which is divided at least into a first area (310) and a second area (320) from the outside to the inside in a display area part (300) of a corresponding liquid crystal panel, wherein an interval between patterns corresponding to a transparent electrode in the first area (310) is set to a first interval (312), an interval between patterns corresponding to a transparent electrode in the second area (320) is set to a second interval (322), the first interval (312) is larger than a corresponding predetermined interval, and the difference between the first interval (312) and the corresponding predetermined interval is larger than the difference between the second interval (322) and the corresponding predetermined interval (S202); and performing developing and etching (S203) on the glass substrate after exposure to form a transparent electrode on the glass substrate. In this mode, the error of an interval between transparent electrodes of the entire display area after formation can be reduced, thus improving the display effect.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a transparent electrode manufacturing method, mask plate and equipment. Background technique [0002] At present, the manufacturing process of the transparent electrode of the substrate of the liquid crystal display is to form a film on the glass substrate and apply a photoresist on the film, and then expose the photoresist through a mask. Due to the shielding effect of the mask, the corresponding part of the pattern of the mask will not be exposed, and in the subsequent development process, the exposed photoresist will be washed away by the developer, and in the etching process, there is The photoresist-protected film will remain, forming the pattern of the transparent electrode. [0003] However, see figure 1 , in the substrate, the transparent electrodes are mainly distributed in the display area 110 (AA, Active Area), therefore, the display area 110 needs to keep more thin...

AI Technical Summary

Problems solved by technology

The same situation also occurs during the etching process, resulting in different spacing between the transparent electrodes in the edge area of ​​the display area 110 and the transparent electrodes in the central area of ​​the display area 110, thereby affecting the display effect.

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