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Method for improving wafer transmission efficiency of target chamber

A technology of transmission efficiency and target chamber, applied in the field of semiconductor device manufacturing control system, can solve the problems of low production efficiency and efficiency, difficult large-scale production line, low transmission efficiency of target chamber wafers, etc., to improve the utilization rate, system stability, reduce The effect of waiting time

Active Publication Date: 2013-01-09
BEIJING SHUOKE ZHONGKEXIN ELECTRONICS EQUIP CO LTD
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AI Technical Summary

Problems solved by technology

[0004] The present invention aims at the relatively low transfer efficiency of target chamber wafers in the prior art, which leads to low production efficiency and benefit, and is difficult to apply to large-scale production lines, and develops a set of target chamber wafer transfer system

Method used

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  • Method for improving wafer transmission efficiency of target chamber

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Embodiment Construction

[0011] Attached below figure 1 The present invention will be further described with specific examples, but not as a limitation to the present invention.

[0012] 1. Main manipulator (1): first judge the current state of the manipulator, and then enter into the process that satisfies the conditions according to different conditions and states.

[0013] 1) Motion error (18), stop and exit the current task.

[0014] 2) If there are wafers on the manipulator, and there are more than 3 wafers in the target chamber, the state is wrong (17), stop the current task and exit.

[0015] 3) If there are already injected wafers on the manipulator, and there are no more than 3 wafers in the target chamber, send them back to the corresponding chip warehouse position (5).

[0016] 4) If there are uninjected wafers on the manipulator, and there are no more than 3 wafers in the target chamber, and there is no wafer on the positioning table, then send the wafer to the orientation table (6); if ...

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Abstract

The invention discloses a method for improving the wafer transmission efficiency of a target chamber. According to the method, four functional modules are included, namely, a primary manipulator (1), a secondary manipulator (2), an orientation platform (3) and a target platform (4), furthermore a plurality of sub-modules for feeding back a wafer to a wafer warehouse (5), conveying the wafer to the orientation platform (6), taking the wafer from the wafer warehouse (7), taking the wafer from the target platform (8), showing state error (17) and ending the task (19) are arranged under the primary manipulator (1); two sub-modules for conveying the wafer to the target platform (9) and taking the wafer from the orientation platform (10) are further arranged under the secondary manipulator (2); three sub-modules for waiting for the secondary manipulator to take the wafer (11), waiting for the secondary manipulator to convey the wafer (12) and for orientation (13) are further arranged under the orientation platform; and each large module is provided with a motion error module (18). The method is characterized in that the primary manipulator (1), the secondary manipulator (2), the orientation platform (3) and the target platform (4) execute respective internal events and are coordinated and allocated by an upper module uniformly, so that the internal disorder of programs and procedures is prevented, the programs and the procedures are simpler and clearer; with the adoption of the method, three wafers can be conveyed inside the target chamber at the same time, so that the utilization rate of the manipulator is improved to the maximum extent, the ideal time is shortened, and the transmission efficiency is improved.

Description

technical field [0001] The invention relates to a semiconductor device manufacturing control system, in particular to a method for controlling the wafer transmission efficiency in a target chamber of an ion implanter. Background technique [0002] An ion implanter is a device that changes the conductivity of the wafer by guiding impurities to be implanted into the semiconductor wafer. The wafer transmission system in the target chamber is directly related to the production efficiency of the equipment and the benefits of the enterprise. We cannot blindly pursue efficiency and ignore the stability of equipment, so stable and efficient transmission efficiency is an important part of contemporary ion implanter equipment. [0003] Therefore, how to develop a set of high-efficiency wafer transfer system in the target chamber is a problem to be solved by the ion implanter control system. Contents of the invention [0004] The present invention aims at the relatively low transfer...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/677H01L21/00
Inventor 杨亚兵伍三忠谢均宇
Owner BEIJING SHUOKE ZHONGKEXIN ELECTRONICS EQUIP CO LTD
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