The invention discloses a method for improving the wafer transmission efficiency of a target chamber. According to the method, four functional modules are included, namely, a primary manipulator (1), a secondary manipulator (2), an orientation platform (3) and a target platform (4), furthermore a plurality of sub-modules for feeding back a wafer to a wafer warehouse (5), conveying the wafer to the orientation platform (6), taking the wafer from the wafer warehouse (7), taking the wafer from the target platform (8), showing state error (17) and ending the task (19) are arranged under the primary manipulator (1); two sub-modules for conveying the wafer to the target platform (9) and taking the wafer from the orientation platform (10) are further arranged under the secondary manipulator (2); three sub-modules for waiting for the secondary manipulator to take the wafer (11), waiting for the secondary manipulator to convey the wafer (12) and for orientation (13) are further arranged under the orientation platform; and each large module is provided with a motion error module (18). The method is characterized in that the primary manipulator (1), the secondary manipulator (2), the orientation platform (3) and the target platform (4) execute respective internal events and are coordinated and allocated by an upper module uniformly, so that the internal disorder of programs and procedures is prevented, the programs and the procedures are simpler and clearer; with the adoption of the method, three wafers can be conveyed inside the target chamber at the same time, so that the utilization rate of the manipulator is improved to the maximum extent, the ideal time is shortened, and the transmission efficiency is improved.