Atomic beam filling processing device
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- XIAMEN UNIV
- Publication Date
- 2013-01-16
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
Figure 1 Figure 2
Abstract
Description
technical field
[0001] The invention relates to a workpiece surface processing method, in particular to an atomic beam filling processing device. Background technique
[0002] Ion beam processing is a typical microfabrication process and ultra-precision processing method for the surface of the sample in units of atoms and molecules. It has broad application prospects in the microelectronics industry and has become an indispensable process in the manufacture of micromachines. (Zhang Dongyan, Chen Techao. Development of a new type of ion beam etching device [J]. Special Equipment for Electronic Industry, 2010, (01): 34-36.), this is a project involving microelectronics, optoelectronics, precision machinery , computer, micro-analysis and other comprehensive fields of high-tech. This technology is mainly used in the field of microfabrication such as etching, implantation, exposure, deposition, mask correction, and integrated circuit repair; the field of high spatial resolution ...