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Quartz glass crucible and method for producing same

A quartz glass crucible and quartz glass technology, applied in glass manufacturing equipment, manufacturing tools, glass molding, etc., can solve problems such as delayed or even prevented, weakened nucleation, and reduced productivity

Active Publication Date: 2013-01-30
SHIN ETABU QUARTZ PRODS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

They are significantly disadvantageous especially in the formation process, they weaken, delay or even prevent nucleation
This reduces the productivity and can even cause the waiting time (Standzeit) to be exceeded during the production process, or cause dislocations in the single crystal, which require the solidified silicon to be melted again

Method used

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  • Quartz glass crucible and method for producing same
  • Quartz glass crucible and method for producing same
  • Quartz glass crucible and method for producing same

Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach ;

[0069] figure 2 A second embodiment for producing a quartz glass crucible according to the invention is shown;

[0070] image 3 shows a third embodiment for producing a quartz glass crucible according to the invention; and

[0071] Figure 4 An embodiment of the quartz glass crucible according to the invention is shown in a cross-sectional side view.

[0072] figure 1The melt apparatus shown schematically in includes a metal melting mold 1 with an inner diameter of 68 cm, a curved bottom and side walls with a height of 50 cm. The melting mold 1 is rotatably supported about its central axis 2 . In the inner chamber 3 of the melting mold 1 protrudes a graphite electrode 4 which is shown to be movable in all spatial directions within the inner chamber 3 .

[0073] In the bottom region of the melting mold 1 and in the wall of the lower half are provided a plurality of through openings 6 , through which the vacuum applied to the outer side of the melting mold 1 can be broug...

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Abstract

In a known method for producing a quartz glass crucible, a vacuum fusion mould is provided, on the inside of which a crucible-shaped granular layer made of SiO2 granules is formed, which layer has a base region and a side wall region. A skin made of low-bubble quartz glass is formed on at least one part of the porous granular layer. Gaseous components are removed from at least one part of the granular layer adjoining the skin by applying a vacuum, and the granular layer is vitrified, forming the quartz glass crucible having a crucible height H. In order to, proceeding therefrom, produce a quartz glass crucible which makes the preparation process easier and in which the risk of contamination by impurities in the silicon melt is low, according to the invention a bubble zone, which contains gas-filled bubbles having a specific bubble volume that is at least twice the specific volume of gas-filled bubbles in low-bubble quartz glass, is produced under the skin and adjoining same in an upper region of the granular layer which adjoins the lower region and extends to the full height H during the vitrification process by applying the vacuum in only or predominantly in a lower region of the granular layer which extends from the base region to no more than 0.8 times the crucible height H.

Description

[0001] The invention relates to a quartz glass crucible for drawing single crystals, the crucible having a crucible height H and a crucible wall with inner sides, the crucible wall being formed by a bottom and a side wall of quartz glass connected to the bottom , wherein the inner side is at least partially covered by a skin layer of dense quartz glass. [0002] Furthermore, the invention relates to a method for producing a quartz glass crucible for drawing single crystals, the method comprising the following method steps: [0003] (a) preparing a vacuum fusion mold with a wall having an inner side, an outer side and a plurality of through holes between the outer side and the inner side, [0004] (b) on the inner side of the vacuum melting mold by SiO 2 The particles form a crucible-shaped, porous particle layer, wherein the particle layer has a bottom region and a sidewall region, [0005] (c) forming a skin layer on at least a portion of the porous particle layer by less-bub...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03B19/09C30B15/10
CPCC30B35/002C30B15/10C30B11/002C03B19/095
Inventor W.莱曼T.凯泽
Owner SHIN ETABU QUARTZ PRODS