Wide test angle ArF laser polarization optics thin film element spectrum test device

Abstract

The utility model discloses a wide test angle ArF laser polarization optics thin film element spectrum test device and belongs to the technical field of deep ultraviolet polarizing optical thin film component spectrum detection. An ArF laser light source, an ArF laser expanded beam collimating mirror, an iris diaphragm, a polarizer and a beam splitter are sequentially arranged on the device from left to right. The beam splitter divides the light into two ways of light. Reflected light direction is reference light path. A reference light analyzer and a reference light detector are arranged in the reference optical path direction from the bottom to the top. Transmission light direction is test light path. A rotating sample stage, a test light analyzer and a test light detector are arranged in the test light path direction from left to right. A focusing lens set is arranged between the test light analyzer and the test light detector. The focusing lens set is composed of convex-concave lens groups in a combined mode. The large test angle ArF laser polarization optics thin film element spectrum test device is used for restraining the light-lose phenomenon on the surface of the detector due to the light spot beam expanding when the wide-angle polarization spectrum is tested.

Description

technical field [0001] The invention belongs to the technical field of spectral detection of polarized optical thin film elements in the deep ultraviolet band, and particularly relates to a method for large test angles (5 o -85 o ) under the ArF laser polarization optical thin film component spectrum testing device. technical background [0002] In recent years, 193nm ArF excimer lasers have been widely used as light sources for deep ultraviolet lithography machines. With the development of lithography technology, the power of lasers used in 193nm lithography machines is increasing day by day, thus putting forward higher requirements on the wavelength accuracy and output efficiency of ArF excimer lasers. In order to achieve high-quality ArF polarized laser output, polarization optical elements are required in the laser cavity. The polarizing optical elements in the laser cavity have an important influence on the power and polarization degree of the laser output. Accurate...

AI Technical Summary

Problems solved by technology

[0003] At present, the measurement devices for the polarization characteristics of optical thin film elements that have been established in the world are mainly spectrometers with polarization optical measurement accessories. The existing dual optical path structure spectrometers with polarization optical measurement accessories, such as the series spectrometer products of the American PE company, However, for the measurement of the polarization characteristics of ArF laser optical thin film components, the above-mentioned measuring device has obvious shortcomings. Coverage up to 193nm wavelength of ArF laser

[0004] When this type of polarization characteristic measuring device measures the reflection spectrum, it needs to use a specially designed reflection measurement accessory, which is limited by its design and the adjustable range of the test incident angle is very limited (o ), cannot satisfy the evaluation of the spectral characteristics of optical components at larger incident angles, and when large incident angles (>15 o ) spectrum test, due to the beam expansion phenomenon of the spot, the test error will increase significantly, and the obtained reflectance or transmittance spectrum test results will be low, and the accurate evaluation of the polarization spectrum characteristics of the sample cannot be completed.

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