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Symmetric type refractive and reflective optical system

An optical system and symmetrical technology, applied in optics, optical components, microlithography exposure equipment, etc., can solve the problems of finding materials with uniform properties that meet the requirements, difficult processing of refraction elements, etc., to achieve cost control and processing difficulty, The effect of reducing the caliber

Active Publication Date: 2013-04-10
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since FPD was put into production in 1980, the size of the screen has become larger and larger, 42 inches, 54 inches, 60 inches or larger, so the size of the compensating refraction unit has also become larger and larger, but such a large size Refractive elements are difficult to process, and materials with uniform performance are also difficult to find

Method used

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  • Symmetric type refractive and reflective optical system
  • Symmetric type refractive and reflective optical system
  • Symmetric type refractive and reflective optical system

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Embodiment 1

[0024] figure 1 Shown is a schematic structural diagram of the first embodiment of the optical system of the present invention. In this embodiment, the optical system 100 can meet the three lines of g, h, and i, and is arranged in sequence along the light propagation direction: the mask pattern is transmitted from the object plane 102 to the image plane 106 through the optical system 100, and the optical system 100 includes a first reflection Mirror 110 , first lens group 112 , second lens group 114 and second mirror 116 . In this catadioptric mirror group, all reflective mirrors and transmissive mirrors are symmetrical about the center of the diaphragm 104, and the imaging optical system 100 can provide a numerical aperture whose NA is 0.1, and the imaging quality and field of view can meet the requirements of a 32-inch FPD screen. The working distance of object space and image space is 821.4mm.

[0025] Each lens in the compensation lens group in the optical catadioptric s...

Embodiment 2

[0032] Figure 4 Shown is a schematic structural diagram of the second embodiment of the optical system of the present invention. In this embodiment, the optical system 200 adds aspherical items on the basis of the first embodiment 100, so that the system can be designed to have a larger field of view, and FPD screens of 42 inches, 47 inches, and 60 inches can be produced. , and the third-order and higher-order aberrations are also well controlled, so with a wider slit width W, the system can also meet the three-line exposure of g, h, and i.

[0033] The optical catadioptric system 200 is arranged along the light propagation direction: the mask pattern is transmitted from the object plane 202 to the image plane 206 through the optical system 200, and the optical system 200 includes a first mirror 210, a first lens group 212, and a second lens group 214 and the second mirror 216 . In this catadioptric mirror group, all reflective mirrors and transmissive mirrors are symmetric...

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Abstract

The invention provides a symmetric type refractive and reflective optical system which is used for photoetching exposure system. The symmetric type refractive and reflective optical system comprises an object plane, a first reflector, a first lens set, a diaphragm, a second lens set, a second reflector and an image plane in sequence along the transmission direction of rays. All optical elements are in an identical optical axis, and the optical system parts in front of and behind the diaphragm are symmetric relative to the diaphragm. The symmetric type refractive and reflective optical system with a large field of view is one-time refractive and reflective projection objective which meets a g-line, an h-line and an i-line and is double telecentric symmetric type, and meets practical product requirements. Due to symmetric design, vertical axis aberration, coma, distortion and the chromatic difference of magnification can be small. The retractor set used for complement is arranged nearby the diaphragm between the two main reflectors, and therefore the caliber of a refraction element is effectively reduced, the ratio of the caliber of the refraction element and the field of view is almost 1:2, and accordingly cost and processing difficulty are effectively controlled.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a large field of view symmetrical catadioptric optical system for a photolithography device. Background technique [0002] The production of flat panel display FPD such as LCD display and LED display involves a manufacturing process similar to that of the integrated circuit (IC) industry. The pattern of the mask plate is imaged through the exposure system to expose the photoresist coated on the substrate, and then process the exposed The circuit pattern is obtained from the substrate, and then the substrate is integrated with other components to obtain a flat panel display. [0003] The traditional method of making FPD, such as U.S. Patent US5710619, US4769680, uses splicing imaging technology. Although the size of the display reaches 18 inches, the yield, yield and alignment problems between splicing adjacent circuits make the produced FPDs are expensive. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B17/08G03F7/20
Inventor 郭银章武珩徐涛
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD