Vibration-isolation platform based on height/horizontal attitude six-dimensional position detection and control

A technology of horizontal posture and vibration isolation platform, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, etc., and can solve the problems of destroying the natural frequency of the air-floating vibration isolation platform and reducing the vibration isolation performance

Inactive Publication Date: 2013-04-17
HARBIN INST OF TECH
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AI Technical Summary

Problems solved by technology

The displacement measurement of the air-floating vibration-isolation platform body must adopt an optical non-contact measurement method, otherwise the sensor will add stiffness and damping to the vibration-isolation system, destroying the natural frequency of the air-floating vibration-isolation platform and reducing the vibration isolation performance

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  • Vibration-isolation platform based on height/horizontal attitude six-dimensional position detection and control
  • Vibration-isolation platform based on height/horizontal attitude six-dimensional position detection and control
  • Vibration-isolation platform based on height/horizontal attitude six-dimensional position detection and control

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Embodiment Construction

[0016] Below in conjunction with accompanying drawing, the present invention is described in further detail:

[0017] A vibration isolation platform based on six-dimensional position detection and control of height / horizontal attitude, the vibration isolation platform body 1 of the device is supported by four vibration isolators 2 evenly distributed below, and the vibration isolators 2 include the first vibration isolation 2a, the second vibration isolator 2b, the third vibration isolator 2c and the fourth vibration isolator 2d; X-direction displacement sensor 3, Z-direction displacement sensor 4 and Y To displacement sensor 5, described X to displacement sensor 3 comprises X to first displacement sensor 3a and X to second displacement sensor 3b, described Z to displacement sensor 4 comprises Z to first displacement sensor 4a, Z to second displacement sensor The sensor 4b and the third displacement sensor 4c in the Z direction are also provided with an X-direction actuator 6, ...

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Abstract

The invention provides a vibration-isolation platform based on height / horizontal attitude six-dimensional position detection and control and belongs to large scale integrated circuit manufacture equipment. A vibration-isolation platform body of the device is supported by four vibration isolators which are uniformly distributed below the vibration-isolation platform body, and an X-direction displacement sensor, a Z-direction displacement sensor, a Y-direction displacement sensor, an X-direction actuator, a Z-direction actuator and a Y-direction actuator are arranged between the vibration-isolation platform body and the ground, so as to form a six-degree-of-freedom position closed-loop motion servo system. According to the invention, the height / horizontal attitude six-dimensional positions can be measured at the same time and calculated by decoupling resolution, and the calculation result is fed to a control system, so as to effectively eliminate the position error sources of the vibration-isolation platform due to inter-coupling between the six degrees of freedom and greatly improve the horizontal attitude precision and vibration isolation property of flotation vibration-isolation platforms.

Description

technical field [0001] The invention belongs to the field of ultra-precision measurement and ultra-precision processing equipment, and mainly relates to a vibration isolation platform based on height / horizontal attitude six-dimensional position detection and control. Background technique [0002] A platform with high-quality vibration isolation performance is the basic guarantee for large-scale integrated circuit manufacturing, and an air-floating vibration isolation platform with high-precision horizontal attitude control is one of the core components of lithography equipment. The horizontal attitude control of the platform is related to the accuracy of the measurement benchmark in the lithography equipment, the control precision of the control system and the imaging quality of the projection objective lens. The reticle width of large-scale integrated circuits is continuously shrinking. At present, the line width has been developed from 45nm to 18nm in foreign countries. E...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 王雷谭久彬赵勃崔俊宁
Owner HARBIN INST OF TECH
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