Lithographic apparatus and method

Abstract

A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane (44) is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles (54) through the membrane. A particle trapping structure (52) is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles (58) from inside the chamber to outside the chamber.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to US Provisional Application 61 / 358,645, filed June 25, 2010, and US Provisional Application 61 / 362,981, filed July 9, 2010, both of which are hereby incorporated by reference in their entirety. technical field [0003] The present invention relates to a lithographic apparatus and method. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. A lithographic apparatus may be used, for example, in integrated circuit (IC) manufacturing processes. In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, transfer of the patte...

AI Technical Summary

Problems solved by technology

Contamination of the patterning device may degrade the imaging performance of the lithographic apparatus and in more severe cases may require replacement of the patterning device

Patterning devices can be expensive, so any reduction in the frequency with which patterning devices must be replaced is advantageous

Furthermore, patterning device replacement is a time-consuming process during which the operation of the lithographic apparatus may have to be stopped

Stopping the operation of the lithographic apparatus may reduce the output of the lithographic apparatus and therefore reduce the efficiency of the lithographic apparatus, which is undesirable

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