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Treatment method of copper etching waste liquid

A treatment method, copper etching technology, applied in the direction of metallurgical wastewater treatment, water/sewage treatment, chemical instruments and methods, etc., can solve the problems of large-scale, increasing the amount of treatment liquid

Active Publication Date: 2014-10-22
KURITA WATER INDUSTRIES LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Also, before processing the solution containing high-concentration hydrogen peroxide, use treatment water to dilute it to reduce the concentration of hydrogen peroxide and then treat it according to the conventional method, but this method requires dilution water, and in addition, it is useless. Increase the amount of treatment liquid, resulting in a problem that the size of the reaction tank, etc. will increase

Method used

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  • Treatment method of copper etching waste liquid
  • Treatment method of copper etching waste liquid
  • Treatment method of copper etching waste liquid

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0061] Next, experimental examples and working examples are given.

[0062]

[0063] The pH of the copper etching waste solution (pH 2.2) of the following composition was not adjusted, and the pH of the copper etching waste solution (pH 2.2) was left as it was, and the change over time of the concentration of hydrogen peroxide in the copper etching waste solution was checked. As a result, the copper etching waste after one day passed The hydrogen peroxide concentration of the liquid was 2.9% by weight, and the hydrogen peroxide concentration hardly decreased. That is, it can be seen from this that hydrogen peroxide in the copper etching waste liquid is not decomposed when left as it is.

[0064] (composition of copper etching waste solution)

[0065] Hydrogen peroxide: 3% by weight

[0066] Copper: 0.4% by weight

[0067] Total nitrogen: 0.8% by weight

[0068] TOC: 1.1% by weight

[0069]

[0070] Sodium hydroxide was added to the copper etching waste liquid of the s...

Embodiment 2

[0075] For the copper etching waste liquid (pH2.2 of hydrogen peroxide concentration 6% by weight, copper concentration 0.7% by weight, all the other ingredients are identical with the copper etching waste liquid in Experimental Example 1), adjust pH in the same way as in Example 1 , and the relationship between the pH adjustment value and the hydrogen peroxide concentration of the copper etching waste liquid after 1 hour was studied. The results are shown in Table 2. In Table 2, the temperature increase (Δt) of the liquid temperature of the copper etching waste liquid after 1 hour is collectively described.

[0076] Table 2

[0077] pH(one)

[0078] As can be seen from Table 2, if the pH of the copper etching waste liquid is adjusted to more than 4, especially when it is more than 6, the hydrogen peroxide in the copper etching waste liquid can be effectively decomposed and removed in a short time of 1 hour. The decomposition of hydrogen is an exothermic reaction, ...

Embodiment 3、4

[0080] With the copper etching waste liquid of the same composition as the copper etching waste liquid processed in embodiment 2 as stock solution, adopt figure 2 In the shown reaction tank, the treatment is carried out in a continuous manner. Fill the reaction tank 1 with treated water in advance, so that the stock solution can circulate according to the specified flow rate. Sodium hydroxide was added as an alkaline agent in the reaction tank 1 to adjust the pH of the liquid in the tank to 7 (Example 3) or 8 (Example 4). The volume of the reaction tank 1 is twice the flow rate of the stock solution per hour, and the residence time of the stock solution in the reaction tank 1 is 2 hours. Table 3 shows the relationship between the liquid passing time at this time and the hydrogen peroxide concentration of the obtained treated water.

[0081] table 3

[0082]

[0083] As can be seen from Table 3, according to the present invention, even if it is a continuous treatment, th...

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Abstract

[Problem] To decompose hydrogen peroxide in a copper etching waste liquor that contains hydrogen peroxide at a high concentration, with high efficiency. [Solution] A method of treating a copper etching waste liquor containing hydrogen peroxide, which comprises adjusting the copper etching waste liquor to pH 4 or more. When a copper etching waste liquid, which is usually a strongly acidic solution having a pH value of 3 or less, is adjusted to pH 4 or more, a copper-containing SS is generated, and the generated SS acts as a catalyst for the decomposition of hydrogen peroxide. Therefore, hydrogen peroxide in the copper etching waste liquid can be decomposed with high efficiency only by adjusting the copper etching waste liquor to pH 4 or more, without the need of dilution or heating, and without the use of any chemical substance other than an alkali agent that is used for adjusting the pH value.

Description

technical field [0001] The present invention relates to a treatment method of copper etching waste liquid containing hydrogen peroxide discharged from a liquid crystal manufacturing process and the like. Background technique [0002] Copper etching treatment in the liquid crystal manufacturing process generally uses a chemical containing high concentration of hydrogen peroxide. Therefore, the copper etching waste liquid discharged from the copper etching process contains high-concentration hydrogen peroxide, and the hydrogen peroxide concentration is usually 1% by weight or more, and may be as high as about 6% by weight. [0003] In the past, it was difficult to treat the copper etching waste liquid with high concentration of hydrogen peroxide, so it was treated as industrial waste after dilution. However, if the concentration of hydrogen peroxide is high, there will be explosion during industrial waste Even if it is used for waste liquid treatment, hydrogen peroxide still ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C02F1/58C02F1/62C22B3/44C22B15/00C23F1/00C23F1/18
CPCC23F1/46C02F2103/16C02F1/722C02F1/62C02F1/66
Inventor 中原敏次
Owner KURITA WATER INDUSTRIES LTD
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