Application of self-assembled film in surface auxiliary laser desorption or ionization flying time mass spectrum
A technology of time-of-flight mass spectrometry and self-assembled membranes, which is applied in the direction of material analysis, measuring devices, instruments, etc. through electromagnetic means, can solve the problems of no reports, etc., and achieve the effect of strong response signal and good analysis effect
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Embodiment 1
[0035] The present invention provides the application of self-assembled film in surface-assisted laser desorption / ionization time-of-flight mass spectrometry, which is characterized in that the self-assembled film of aromatic thiol compound is used for surface-assisted laser desorption / ionization time-of-flight mass spectrometry (SALDI) for small molecules. -TOF MS).
[0036] Contains the following process:
[0037] (1) Preparation of self-assembled films of aromatic thiol compounds for surface-assisted laser desorption / ionization of small molecules. The preparation includes the following steps:
[0038] (A) First, ultrasonically clean the silicon wafer in a toluene solution to remove surface contamination, then use a diluted hydrofluoric acid solution to corrode the contamination on the silicon surface, and finally rinse the silicon wafer repeatedly with deionized water to obtain a Processed silicon wafers;
[0039] (B) First, use a magnetron radio frequency sputtering device to spu...
Embodiment 2
[0046] The present invention provides the application of self-assembled film in surface-assisted laser desorption / ionization time-of-flight mass spectrometry, which is characterized in that the self-assembled film of aromatic thiol compound is used for surface-assisted laser desorption / ionization time-of-flight mass spectrometry (SALDI) for small molecules. -TOF MS).
[0047] Contains the following process:
[0048] (1) Preparation of self-assembled films of aromatic thiol compounds for surface-assisted laser desorption / ionization of small molecules. The preparation includes the following steps:
[0049] (A) First, ultrasonically clean the silicon wafer in a toluene solution to remove surface contamination, then use a diluted hydrofluoric acid solution to corrode the contamination on the silicon surface, and finally rinse the silicon wafer repeatedly with deionized water to obtain a Processed silicon wafers;
[0050] (B) First, use a magnetron radio frequency sputtering device to spu...
Embodiment 3
[0055] The present invention provides the application of self-assembled film in surface-assisted laser desorption / ionization time-of-flight mass spectrometry, which is characterized in that the self-assembled film of aromatic thiol compound is used for surface-assisted laser desorption / ionization time-of-flight mass spectrometry (SALDI) for small molecules. -TOF MS).
[0056] Contains the following process:
[0057] (1) Preparation of self-assembled films of aromatic thiol compounds for surface-assisted laser desorption / ionization of small molecules. The preparation includes the following steps:
[0058] (A) Pretreatment of silicon wafers;
[0059] (B) Sputtering Ti and Au sequentially on the pre-treated silicon wafer to obtain a gold substrate; and
[0060] (C) Put the gold substrate in the alcohol solution of the aromatic thiol compound for self-assembly reaction, take it out after sufficient reaction time, rinse with alcohol and dry, to obtain the self-assembled film of the aromatic...
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