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A navigation sheet and navigation method for dry engraving equipment

A kind of equipment and dry etching technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problem of high incidence of etching defects

Active Publication Date: 2017-02-01
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The present invention provides a navigation sheet and a navigation method for dry etching equipment, to achieve the purpose of quickly and accurately locating the placement position of the silicon chip and avoiding the occurrence of etching defects, so as to solve the above-mentioned high incidence of etching defects

Method used

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  • A navigation sheet and navigation method for dry engraving equipment
  • A navigation sheet and navigation method for dry engraving equipment
  • A navigation sheet and navigation method for dry engraving equipment

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Embodiment Construction

[0037] The core idea of ​​the present invention is to provide a navigation sheet for dry engraving equipment, the navigation sheet is a transparent disc, the diameter of the navigation sheet is less than or equal to the diameter of the inner ring of the bearing ring, and the navigation sheet Scales are provided in multiple radial directions. After the maintenance or repair of the dry engraving equipment is completed, the navigation silicon wafer can be used to determine the transfer position of the manipulator before the silicon wafer is formally produced. When the manipulator placed the navigation sheet on the bearing circle, because the navigation sheet was transparent and also provided with scales in its radial direction, the offset data of the navigation sheet could be read from the scale of the navigation sheet, and the The offset data is fed back to the manipulator to correct the placement position of the subsequent manipulator, and the above steps are repeated until the...

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Abstract

The invention discloses a navigating piece used for dry etching equipment and a navigating method. The dry etching equipment comprises a ESC (electronic stability control) base and a bearing ring for bearing a silicon wafer, a first reference ring and a second reference ring which are concentric are arranged on the ESC base, the navigating piece is a transparent circular piece, the diameter of the navigating piece is smaller than that of an inner ring of the bearing ring, and graduations are arranged in multiple radial directions of the navigating piece. Adopting the navigating piece for navigation can enable a manipulator to place the navigating piece or the silicon wafer on a position more quickly and more accurately, so that etching defects caused by displacement of the position where the silicon wafer is placed are overcome.

Description

technical field [0001] The invention belongs to the field of semiconductor manufacturing, and in particular relates to a navigation sheet and a navigation method for dry engraving equipment. Background technique [0002] In the semiconductor manufacturing process, it is necessary to repeatedly perform cleaning, coating, exposure, and etching processes on semiconductor silicon wafers. The etching process includes dry etching and wet etching. Dry etching usually uses glow discharge (glow discharge) to generate plasma (plasma) containing charged particles such as ions, electrons, and highly chemically active neutral atoms, molecules, and free radicals. technique for etching. [0003] Such as figure 1 and figure 2 As shown, the dry etching equipment generally includes a dry etching chamber 101, an ESC base 102, a top edgering 103, and an anode top cover (not shown) arranged on the ESC base 102. The top edgering of the top edger 103 The stepped surface is flat with the surfa...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/68
Inventor 杜廷卫
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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