Plasma treatment device
A plasma and processing device technology, applied in the field of ion-enhanced chemical vapor deposition devices, can solve the problems of uneven distribution of reaction gases, decreased film quality, uneven film thickness, etc.
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[0042] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0043] In the following description, many specific details are set forth in order to fully understand the present invention, but the present invention can also be implemented in other ways than those described here, so the present invention is not limited by the specific embodiments disclosed below.
[0044]The present invention provides a plasma processing device, including a processing chamber, the processing chamber includes a top wall, a bottom wall opposite to the top wall, and a side wall formed between the top wall and the bottom wall, the processing An air inlet device is provided on the wall of the chamber, an exhaust port is formed on the side wall, a process area is included in the processing chamber, and an exhaust device is...
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