Housing and manufacturing method thereof
A manufacturing method and housing technology, which can be applied to electrical equipment shells/cabinets/drawers, ion implantation plating, superimposed layer plating, etc., and can solve the problems of wear resistance, bright blue instability, etc.
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Embodiment 1
[0042] 1. Ultrasonic cleaning
[0043] The substrate 11 made of stainless steel (model 316L) was put into an ethanol solution for ultrasonic cleaning to remove impurities and oil stains on the surface of the substrate 11, and dried for later use after cleaning.
[0044] 2. Coating
[0045] Magnetron sputtering equipment (produced by Shenzhen Nanfang Innovation Vacuum Technology Co., Ltd., model SM-1100H. The magnetron sputtering equipment includes a vacuum chamber, a turntable, a magnetron target and a bias power supply. The magnetron target is a target structure , including two pairs of chromium targets, a certain distance is formed between each pair of targets. The substrate is fixed on the turntable, and the turntable drives the substrate to pass between each pair of chromium targets when the turntable rotates.
[0046] Target washing: adjust the absolute pressure in the vacuum chamber to 6.0×10 -3 Pa, then pass argon gas into the vacuum chamber until the pressure is 0.8 ...
Embodiment 2
[0053] 1. Ultrasonic cleaning
[0054] The substrate 11 made of stainless steel (model 316L) was put into an ethanol solution for ultrasonic cleaning to remove impurities and oil stains on the surface of the substrate 11, and dried for later use after cleaning.
[0055] 2. Coating
[0056] Magnetron sputtering equipment (produced by Shenzhen Nanfang Innovation Vacuum Technology Co., Ltd., model SM-1100H) is used. The magnetron sputtering equipment includes a vacuum chamber, a turntable, a magnetron target and a bias power supply. The magnetron target is a pair target structure, including two pairs of chromium targets, and a certain distance is formed between each pair of targets. The substrate is fixed on the turntable, and when the turntable rotates, the substrate is driven to pass between each pair of chromium targets.
[0057] Target washing: adjust the absolute pressure in the vacuum chamber to 4.0×10 -3 Pa, then pass argon gas into the vacuum chamber until the pressur...
Embodiment 3
[0064] 1. Ultrasonic cleaning
[0065] Put the substrate 11 made of stainless steel (model 316L) into absolute ethanol for ultrasonic cleaning to remove impurities and oil stains on the surface of the substrate 11, and dry it for later use after cleaning.
[0066] 2. Coating
[0067] Magnetron sputtering equipment (produced by Shenzhen Nanfang Innovation Vacuum Technology Co., Ltd., model SM-1100H) is used. The magnetron sputtering equipment includes a vacuum chamber, a turntable, a magnetron target and a bias power supply. The magnetron target is a pair target structure, including two pairs of chromium targets, and a certain distance is formed between each pair of targets. The substrate is fixed on the turntable, and when the turntable rotates, the substrate is driven to pass between each pair of chromium targets.
[0068] Target washing: adjust the absolute pressure in the vacuum chamber to 6.0×10 -3 Pa, then feed argon gas into the vacuum chamber until the pressure is 1...
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Abstract
Description
Claims
Application Information
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