Photovoltaic glass sputtering target cathode self-circulation cooling device

Abstract

The invention relates to a photovoltaic glass sputtering target cathode self-circulation cooling device, which comprises a circulation system unit, an ice water inlet unit connected to the circulation system unit, and a temperature control valve water inlet system unit arranged on the ice water inlet unit and the circulation system unit. The ice water inlet unit is a factory service end water inlet system, the water temperature keeps at 10-15 DEG C, and cooling water is output to the circulation system and a bypass connecting pipeline and the cooling water device for backflow. When the temperature control valve water inlet unit does not operate, the circulation system circulates cooling water in the pipe by a self-circulation mode to a sputtering target cathode, the water current and water pressure circulated to the sputtering target cathode can be independently controlled, when the temperature control valve water inlet unit operates, the valve is opened, cooling water in the cooling water inlet unit is introduced in the circulation system unit for rapidly cooling the temperature of the target cathode, after the temperature is decreased, the valve is closed, the circulation system is back to a previous state, cooling water in the pipe is circulated to the target cathode, thereby, the sputtering target cathode can independently control the temperature, heat exchange efficiency is good, and the water-saving efficacy can be reached.

Description

technical field [0001] The invention belongs to a photovoltaic glass sputtering target self-circulation cooling device, in particular to a photovoltaic glass sputtering target self-circulation cooling device, in particular to a device capable of dissipating the working heat energy of a vacuum sputtering target to ensure that the target Pole is functioning normally. Background technique [0002] The photovoltaic glass sputtering target is mainly used as the source of sputtering, and it operates in the form of physical vapor deposition. Its working principle is to connect a high-voltage power supply to the vacuum chamber to dissociate the working gas in the chamber, and at the same time use the sputtering target as the cathode , the dissociated working gas contains positive ions and electrons, and the positive ions will be accelerated to the target of the cathode under the action of a high-voltage electric field, and bombard the sputtering raw material on the target, so that t...

AI Technical Summary

Problems solved by technology

Therefore, this process will generate extremely high heat energy on the target, and the waste heat needs to be dissipated in a timely manner, otherwise the target will have great side effects due to excessive temperature, and even fail to work

At present, the common practice is to connect the cooling water circuit on the target to connect the whole system. As we all know, this kind of method often faces problems such as large water consumption, water pressure and water temperature that cannot be independently controlled.

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