A mask plate for effectively improving vapor deposition quality and a production process thereof

A technology for preparation process and mask, which is applied in the field of high-precision manufacturing, and can solve the problem that the mask is easy to be thermally expanded

Inactive Publication Date: 2013-07-17
KUN SHAN POWER STENCIL
View PDF5 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The purpose of the present invention is to at least solve one of the above-mentioned technical defects

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A mask plate for effectively improving vapor deposition quality and a production process thereof
  • A mask plate for effectively improving vapor deposition quality and a production process thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033]

[0034] The embodiments of the present invention are described in detail below. Examples of the embodiments are shown in the accompanying drawings, in which the same or similar reference numerals indicate the same or similar elements or elements with the same or similar functions. The embodiments described below with reference to the drawings are exemplary, and are only used to explain the present invention, but should not be understood as limiting the present invention.

[0035] The main innovation of the present invention is that the present invention is innovatively proposed.

[0036] See figure 1 In the embodiment of the present invention, the mask includes a mask body 12, the mask body 12 is provided with a pattern opening 11, and the material of the mask body 11 is 4J36 invar alloy. 4J36 Invar alloy contains 64% Fe and 36% Ni by weight. 4J36 Invar alloy has a face-centered cubic structure. The mask body 12 is also plated with a nickel-iron alloy coating, the uniformit...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a mask plate for effectively improving vapor deposition quality including a mask plate body. The mask plate body is provided with a pattern opening, and is made from the material of Invar alloy 4J36. The material of Invar alloy 4J36 is adopted to make the mask plate body, because the material has anomalous thermal expansion of an invar effect, and an average expansion coefficient thereof is generally 1.5*10<-6> DEG C, reaches 1.8*10<-8> DEG C when the nickel content of the material is 36%, and is invariable at the temperature range of -80 DEG C- +100 DEG C. Thus, the deformation of the mask body and the mask frame made from the material is very small in a vapor deposition chamber, for effectively reducing the dimensional accuracy deviation of a pattern opening and the positional accuracy deviation of the pattern opening, effectively improving vapor deposition quality, and increasing the film-forming rate of an organic vapor deposition material.

Description

[0001] technical field [0002] The invention relates to the field of high-precision manufacturing, in particular to an evaporation system for effectively improving the quality of evaporation [0003] A mask plate for plating, and a corresponding preparation process thereof. [0004] Background technique [0005] According to the material of the light emitting layer, electroluminescent display devices can be classified into inorganic electroluminescent display devices and organic electroluminescent display devices. Since organic electroluminescent display devices can have higher brightness and faster response time compared with inorganic electroluminescent display devices, and can also display color images, in recent years, organic electroluminescent display devices have become popular in the field of organic electroluminescent display devices. corresponding development has been achieved. [0006] Generally, an organic light emitting display device includes an organic li...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C14/04C22C38/08C23F1/02
Inventor 魏志凌高小平郑庆靓
Owner KUN SHAN POWER STENCIL
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products