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A sagging preventive mask framework and a sagging preventive mask assembly

A technology of mask components and frames, which is applied in the direction of photo-engraving process, optics, etc. for photomechanical processing of originals, patterned surfaces, etc. It can solve the problem of imprecise arrangement of material deposition on the substrate, different procedures cannot be produced at the same time, and batch production Large requirements and other issues, to achieve the effect of improving the evaporation precision, preventing pattern deformation, and low production cost

Inactive Publication Date: 2013-07-17
KUN SHAN POWER STENCIL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Disadvantages: large batch requirements, every time the program is modified, the photolithography board needs to be re-made, different programs cannot be produced at the same time, and the delivery cycle is long
As such, the pattern mask of the mask assembly is pressed by the substrate and deformed, causing imprecise alignment and material deposition on the substrate

Method used

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  • A sagging preventive mask framework and a sagging preventive mask assembly
  • A sagging preventive mask framework and a sagging preventive mask assembly
  • A sagging preventive mask framework and a sagging preventive mask assembly

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0031] Such as figure 1 As shown, a mask frame for preventing sagging includes a frame 1 and a support bar 2, and the frame 1 and the support bar 2 are integrally formed and are on the same horizontal plane. The support bars 2 are parallel to each other and arranged longitudinally. There is a gap between the support bars 2, the size of which is greater than or equal to the size of the opening of the pattern area of ​​the mask plate, and the width of the support bars is less than or equal to the gap between the openings of the pattern area of ​​the mask plate. There are equal gaps between the support bars 2 .

[0032] Such as Figure 4 As shown, a sagging-preventing mask assembly includes the above-mentioned sagging-preventing mask frame and a mask plate, and the sagging-preventing mask frame is welded to the mask plate. The longitudinal support bar of the mask frame is aligned with the gap between the longitudinal pattern area of ​​the mask plate, there is a welding point b...

Embodiment 2

[0035] Such as figure 2 As shown, a mask frame for preventing sagging includes a frame 1 and a support bar 2, and the frame 1 and the support bar 2 are integrally formed and are on the same horizontal plane. The support bars vertically and horizontally intersect each other, the longitudinal support bars 2 are parallel to each other, and the horizontal support bars 2 are also parallel to each other, and the support bars intersect vertically and horizontally to form a grid 3 . The size of the grid 3 is greater than or equal to the size of the opening of the pattern area of ​​the mask. The sizes of the grids 3 are consistent. Ensure that the support bar 2 cannot block the opening of the pattern area of ​​the mask.

[0036] A sagging-preventing mask assembly includes the above-mentioned sagging-preventing mask frame and a mask plate, and the mask frame is welded to the mask plate. The vertical and horizontal support bars of the mask frame are aligned with the vertical and hori...

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PUM

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Abstract

The invention relates to a sagging preventive mask framework and a corresponding mask assembly. The sagging preventive mask framework comprises a side frame and a support bar, and the side frame and the support bar are formed in an integral molding form; the corresponding mask assembly comprises the sagging preventive mask framework and a mask plate, and the mask framework is welded with the mask plate. The mask framework and the anti-sagging mask assembly provided by the invention effectively prevent pattern deformation of the mask plate caused by the gravity of the mask plate on the mask assembly during evaporation, effectively improve the evaporation precision, are low in production cost and high in efficiency, and have a wide market prospect.

Description

[0001] technical field [0002] The invention relates to a mask frame for preventing sagging and a mask component for preventing sagging, which belong to the application field of mask plates. [0003] Background technique [0004] MASK (mask): Single-chip mask means that the program data has been made into a photolithography plate, and the program is made in the process of single-chip production. The advantages are: the procedure is reliable and the cost is low. Disadvantages: The batch requirement is large, and the photolithography board needs to be re-made every time the program is modified. Different programs cannot be produced at the same time, and the delivery cycle is long. [0005] In semiconductor manufacturing, many chip processing steps use photolithography. The patterned "negative" used in these steps is called a mask (also called "mask"). Its function is: in selected areas on the silicon wafer Masks an opaque graphic template so underlying erosion or diffusio...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/64G03F1/62
Inventor 魏志凌高小平郑庆靓吴小燕
Owner KUN SHAN POWER STENCIL
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