Sub-aperture stitching-based high-accuracy planar optical element face type detection method

A technology of sub-aperture splicing and optical components, applied in the direction of optical devices, measuring devices, instruments, etc., can solve the problems of low precision of high-precision large-diameter planar optical components, and achieve the effect of an economical and effective detection method

Inactive Publication Date: 2013-07-24
TONGJI UNIV
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Problems solved by technology

[0006] The purpose of the present invention is to overcome the shortcomings of the existing sub-aperture splicing technology for detecting the low precision of high-precision large-diameter planar optical elements in planar sub-aperture splicing interferometry, and propose a high-precision planar optical element surface shape detection based on sub-aperture splicing method to realize high-precision testing of sub-aperture splicing interference inspection

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  • Sub-aperture stitching-based high-accuracy planar optical element face type detection method
  • Sub-aperture stitching-based high-accuracy planar optical element face type detection method
  • Sub-aperture stitching-based high-accuracy planar optical element face type detection method

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Embodiment 1

[0022] Embodiment 1: its structure is as figure 1 As shown, the device includes a two-dimensional (XZ) translation stage 1, a standard flat lens 3, a Fizeau type interferometer 4,

[0023] The standard plane lens 3 is fixed on the exit pupil of the Fizeau-type interferometer 4. At the same time, the plane optical element 2 is placed on the XZ translation stage 1, so that the position of the plane optical element 2 can be adjusted. The exit pupil of the small-aperture interferometer 4 is facing The plane optical element 2 adjusts the rotation of the XZ translation stage 1 in the X and Z directions, so that the plane optical element 2 is parallel to the standard plane lens 3, so as to measure the interference image.

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Abstract

The invention relates to a sub-aperture stitching-based high-accuracy planar optical element face type detection method. A detection device comprises a two-dimensional translation table, an interferometer and a standard planar lens. The method specifically comprises the following steps: fixing a planar optical element on the two-dimensional translation table and arranging the interferometer aiming at the position of the planar optical element; adjusting the two-dimensional translation table to reach a specified target distribution region to align an exit pupil of the interferometer with a geometric central part of the planar optical element; sampling, measuring and calculating the geometric central part by the interferometer to obtain sub-aperture face type information; and repeating the steps until the measurement of all sub-apertures is finished, thereby realizing sub-aperture measurement of the planar optical element. According to the method, the complete face type of the measured planar element is restored through a certain stitching algorithm aiming at the characteristic of higher planarity of the face type of the high-accuracy planar optical element, and an economic and effective detection method is provided for checking the face type of the high-accuracy planar optical element.

Description

technical field [0001] The invention relates to the field of surface shape interferometry testing of large-diameter planar optical elements, in particular to a method for detecting the surface shape of high-precision planar optical elements based on sub-aperture splicing. Background technique [0002] The manufacture of modern optical components is a dynamic and integrated manufacturing mode. As an important feedback and evaluation index, surface test is essential to ensure the manufacturing quality of optical components. With the continuous improvement of processing quality requirements for large optical components, the connotation of its quality standards is also constantly enriched. The quality control of full aperture and full spatial frequency has become a new goal in the manufacturing process, and the detection of surface error It has become the main target of large-aperture optical components. [0003] Sub-aperture splicing interferometry is one of the important tech...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/24
Inventor 沈正祥徐旭东孙晓雁王晓强马彬程鑫彬王占山
Owner TONGJI UNIV
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