Method for realizing high-trapping-light nanostructure single-face texture surface making
A nano-structured, single-sided texturing technology, applied in chemical instruments and methods, final product manufacturing, sustainable manufacturing/processing, etc. effect on large-scale applications
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[0029] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0030] In order to further explain the technical means and effects that the present invention adopts to achieve the intended purpose of the invention, below in conjunction with the accompanying drawings and preferred embodiments, the specific implementation method, The structure, characteristics and functions thereof are detailed as follows:
[0031] Such as figure 1 as shown, figure 1 It is a flowchart of a method for realizing high-light-trapping nanostructure single-sided texturing according to an embodiment of the present invention, and the method includes the following steps:
[0032] Step 001, cleaning the silicon wafer by RCA method;
[0033] Step 002, performing re-diffusion on the surface of the silicon wafer;...
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