Vacuum pumping system
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- EDWARDS LTD
- Publication Date
- 2013-07-31
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
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Abstract
Description
technical field
[0001] The invention relates to a vacuum pumping system for evacuating a vacuum chamber. Background technique
[0002] The manufacture of many items requires the use of vacuum chambers. For example, the processing of silicon wafers takes place in a high vacuum. In addition, devices such as flat panel display devices and solar cells need to be processed in a vacuum chamber. In these latter instances, the vacuum chamber may need to have a larger volume to handle larger items. Typically, the pressure in the vacuum chamber needs to be cycled between atmospheric pressure (1 bar) and process pressure (eg, 0.01 mbar) as part of the process cycle. In order to improve manufacturing speed and efficiency, it is desirable to utilize a vacuum pumping system to increase the rate at which gas is evacuated from the vacuum chamber.
[0003] The vacuum pumping system may include a vacuum pump and a foreline connecting an inlet of the vacuum pump to the vacuum chamber so th...