Measurement method for crystal material crystal direction

A technology of crystal materials and measurement methods, applied in material analysis using radiation diffraction, analysis of solids using sonic/ultrasonic/infrasonic waves, etc., can solve the problems of increasing processing steps, difficulty in fixing, and lack of processing continuity, so as to avoid reading errors. Effect

Inactive Publication Date: 2013-08-07
HEFEI JINGQIAO PHOTOELECTRIC MATERIAL
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Problems solved by technology

[0005] This crystal orientation measurement method has the following disadvantages: 1. The test requires a macroscopic surface, that is, a smooth plane, which increases the processing steps before the test; 2. This test is applicable to tangible samples such as thin films, wafers, and blocks. , It is not suitable for samples with irregular shapes and rough surfaces, and the range of test samples is narr

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  • Measurement method for crystal material crystal direction
  • Measurement method for crystal material crystal direction
  • Measurement method for crystal material crystal direction

Examples

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Example Embodiment

[0022] A measuring instrument is used to measure the crystal orientation of the crystal material. The measuring instrument includes a rotating table assembly 18, an ultrasonic probe 24, an orientation head 20, a motor 27, an XRD probe and a display (not shown).

[0023] Such as figure 2 , Fix the crystal in the fixture of the rotating table assembly 18, use the ultrasonic probe 24 to set a virtual plane for measurement, the orienting head 20 moves downwards, and under the detection of the ultrasonic probe 24, to the set virtual plane The plane stops, and the rotating worktable assembly 18 is driven by the motor 27 to rotate 360 ​​degrees, the rotation accuracy is ≤30", and the XRD detector is used for scanning. According to the characteristics of the crystal, it will be displayed on the display as image 3 The waveform of the schematic shown, image 3 The X axis is the position angle of the rotating worktable, and the Y axis is the angle value measured by the crystal orientation a...

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Abstract

The present invention provides an X-ray detection method for crystal direction deviation of a crystal or a crystal direction of a crystal rod processing crystal surface. According to the present invention, the adopted measurement method is: carrying out crystal direction scanning on a crystal surface, finding a crystal position angle under a peak through a surface scanning curve, and measuring angle deviation of the crystal direction at the position angle through a trough position angle; and the crystal direction can be accurately corrected with one scanning and two braking rotations.

Description

technical field [0001] The invention relates to a method for measuring the crystal orientation deviation or the crystal orientation of a processed crystal plane of a crystal bar, in particular to an X-ray detection method for the crystal orientation deviation or the crystal orientation of a processed crystal plane of a crystal rod. Background technique [0002] Single crystal materials are widely used in cutting-edge science and technology, such as single crystal silicon, sapphire single crystal, etc. Due to the special crystal structure and crystal characteristics of single crystal materials, they are widely used in the semiconductor industry and optical optical lenses, prisms, and observation windows. It is widely used and has remarkable optical properties in a specific crystal direction, but the existing orientation instrument and direction finding method cannot accurately measure and correct the crystal orientation when measuring the crystal orientation. [0003] Orienta...

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Application Information

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IPC IPC(8): G01N23/20G01N29/04
Inventor 林鸿良陈俊
Owner HEFEI JINGQIAO PHOTOELECTRIC MATERIAL
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