Shower head and vapor deposition equipment

A sprinkler head and gas cavity technology, applied in the field of semiconductor equipment, can solve the problems of uncontrollable surface temperature of the sprinkler head, and achieve the effects of enhanced adaptability, increased temperature, and improved quality

Inactive Publication Date: 2013-08-14
光垒光电科技(上海)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a shower head to solve the problem of uncontrollable surface temperature of the shower head in the prior art

Method used

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  • Shower head and vapor deposition equipment
  • Shower head and vapor deposition equipment

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Embodiment Construction

[0012] It can be seen from the content recorded in the background art that the shower head in the prior art has the problem of uncontrollable temperature. The core idea of ​​the present invention is that by introducing at least a conductive layer, the thermal wall plate under the shower head is connected to a power source, so that the temperature control of the thermal wall plate can be realized.

[0013] Please refer to figure 2 , the present invention provides a shower head for MOCVD process, including a shower head body 1, the shower head body 1 has at least two gas chambers 10, 11 and a water cooling chamber 12; in this embodiment, The gas chamber at least includes a Group III source chamber 10 and ammonia gas (NH 3 ) cavity 11, the group III source cavity 10 and the ammonia gas cavity 11 are stacked, for example, it can be figure 2 The shown group III source chamber 10 is located above the ammonia gas chamber 11, the water cooling chamber 12 is located below the ammon...

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PUM

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Abstract

The invention discloses a shower head, and vapor deposition equipment. The shower head comprises a shower head body and a hot wall plate which is arranged below the shower head body and at least comprises a conducting layer, wherein the conducting layer is connected with a power source, and is capable of absorbing heat generated by a heater so as to guarantee a certain temperature; and when the power source is switched on, the conducting layer is electrified to heat because of electric current, the temperature of the hot wall plate is preferably enhanced, the temperature of the surface of the shower head is enhanced, and meanwhile, the temperature of the hot wall plate (and the surface of the shower head) can be regulated and controlled, and therefore, the industrial art requirement is suitable. Therefore, the shower head provided by the invention is more adaptive to the vapor deposition technology, and the quality of a film layer formed by the vapor deposition technology is largely improved.

Description

technical field [0001] The invention relates to semiconductor equipment, especially a shower head and vapor deposition equipment. Background technique [0002] The basic growth process of chemical vapor deposition, such as metalorganic chemical vapor deposition (MOCVD) process, is to introduce the reaction gas from the gas source into the reaction chamber, and use the substrate heated by the heater to initiate a chemical reaction, thereby forming a single crystal or polycrystalline film. In the MOCVD process, the reactants required for film growth rely on gas transport (such as flow and diffusion) to reach the growth surface. During the transport process, chemical reactions also occur. Finally, the growth particles are combined into the film lattice through adsorption and surface reactions. . [0003] In the existing process, the corresponding reaction gas is usually provided by the showerhead. In order to prevent the heat generated by the heater under the showerhead from ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/455
Inventor 黄允文
Owner 光垒光电科技(上海)有限公司
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