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Particle pollution monitoring system and chemical vapor deposition device

A technology of chemical vapor deposition and monitoring system, applied in the field of particle pollution monitoring system and chemical vapor deposition equipment, can solve the problem of not being able to find particle pollution in time

Inactive Publication Date: 2013-09-04
SHANGHAI HUALI MICROELECTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a particle pollution monitoring system and chemical vapor deposition equipment to solve the problem that particle pollution cannot be found in time in the prior art

Method used

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  • Particle pollution monitoring system and chemical vapor deposition device
  • Particle pollution monitoring system and chemical vapor deposition device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Please refer to figure 1 , figure 1 Shown is a schematic structural diagram of a particle pollution monitoring system according to an embodiment of the present invention. Such as figure 1 As shown, the particle pollution monitoring system 1 is used to monitor the particle pollution of the monitored object, and the monitored object includes an air extraction device, and the particle pollution monitoring system 1 includes:

[0031] at least one particle counting device 10;

[0032] Wherein, the particle counting device 10 is connected with the air extraction device 20 .

[0033] Specifically, the particle counting device 10 includes a host 11 , a particle counter 12 , a sampling pipeline 13 and a sampling valve 14 . Wherein, the host computer 11 is respectively connected with the particle counter 12 and the sampling valve 14 through the data connection line, and is used for controlling the particle counter 12 and the sampling valve 14 . The air extraction device 20 c...

Embodiment 2

[0040] Please refer to figure 2 , figure 2 Shown is a partial structural schematic diagram of a chemical vapor deposition device according to an embodiment of the present invention. Such as figure 2 As shown, the chemical vapor deposition equipment includes:

[0041] Deposition chamber, transfer chamber, equipment host 50 and particle pollution monitoring system;

[0042] Wherein, the deposition chamber and the transfer chamber are both provided with an air extraction device 40, and the particle pollution monitoring system includes at least one particle counting device 30, and the particle counting device 30 is connected with the air extraction device 40 and the equipment host 50 connect.

[0043] Specifically, the air extraction device 40 includes an air extraction pump 41, an air extraction valve 42, an air extraction pipeline 43 and a throttle valve 44, wherein the air extraction pump 41 is connected with the air extraction pipeline 43, and the air extraction valve 4...

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Abstract

The invention provides a particle pollution monitoring system for monitoring a particle pollution situation of a monitored object. The monitored object comprises an air-exhausting apparatus. The particle pollution monitoring system comprises at least one particle counter apparatus, wherein the particle counter apparatus is connected with the air-exhausting apparatus. In the particle pollution monitoring system provided by the invention, the particle counter apparatus is connected with the air-exhausting apparatus of the monitored object, particles of the monitored object can be monitored at any time, and the particle pollution can be found out timely.

Description

technical field [0001] The invention relates to the technical field of integrated circuit manufacturing, in particular to a particle pollution monitoring system and chemical vapor deposition equipment. Background technique [0002] As we all know, in the process of integrated circuit manufacturing, particle contamination is the main cause of defects and affecting yield. Moreover, with the development of the integrated circuit manufacturing process, the size of the wafer is getting larger and larger. Currently, the 12-inch wafer has become the mainstream, which means that the cost of a single wafer is getting higher and higher. Once the wafer is scrapped due to particle contamination, the loss will be even greater. In order to reduce losses, it is generally necessary to monitor particle pollution during the manufacturing process. Once serious particle pollution is found, timely measures can be taken to avoid large-scale scrapping. [0003] At present, there are mainly two w...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/44C23C16/52
Inventor 雷通
Owner SHANGHAI HUALI MICROELECTRONICS CORP