Roll-to-roll vertical type magnetic control film plating device

Abstract

The invention discloses a roll-to-roll vertical type magnetic control film plating device. The roll-to-roll vertical type magnetic control film plating device comprises a film plating chamber, wherein one end of the film plating chamber is connected with an unreeling chamber; the unreeling chamber is internally provided with an unreeling roller and a guide roller with vertical shafts; the other end of the film plating chamber is connected with a reeling chamber; the reeling chamber is provided with a reeling roller and a first guide roller with vertical shafts; the side wall of the film plating chamber is provided with a magnetron sputtering target; the target face of the magnetron sputtering target is vertical and is parallel to a plane of a flexible substrate; slits, through which the flexible substrate passes, are respectively arranged between the unreeling chamber and the film plating chamber, and between the film plating chamber and the reeling chamber; the unreeling chamber, the film plating chamber and the reeling chamber are respectively provided with an independent air exhausting system. The device disclosed by the invention can prevent foreign gas from polluting the film plating chamber so as to guarantee that a film layer is not polluted by impurities; meanwhile, fine powder and grains generated in a chamber body are prevented from falling onto the surface of the flexible substrate and the target face of the magnetron sputtering target, thereby avoiding a needle hole in the film layer and guaranteeing the quality of the film layer.

Description

technical field [0001] The invention relates to the field of coating technology, in particular to a roll-to-roll vertical magnetron coating device. Background technique [0002] The roll-to-roll vertical magnetron sputtering coating device is mainly used for coating metal, non-metal, and / or oxide films on flexible substrates under vacuum conditions. Specifically, it can be applied to, for example, plating flexible thin-film solar cell surface electrodes, back electrodes, CIG semiconductor layers, and conductive layers of flexible circuit boards. [0003] The common roll-to-roll vacuum magnetron coating equipment in the prior art is a single equipment. The basic structure of the equipment generally consists of a vacuum chamber, a winding roller, an unwinding roller, multiple guide rollers, a cooling drum, a It is composed of a group of rectifying rollers, etc., and they are all horizontal structures, that is, the target is below or above the cooling drum. During the working ...

AI Technical Summary

Problems solved by technology

[0004] The existing roll-to-roll vacuum magnetron coating equipment has fewer target positions due to its structure, and the sputtering material is single; due to the horizontal structure, the target and the flexible substrate are in a horizontal position when the equipment is working, and the coating process is vacuum The fine particles formed inside the chamber will fall on the flexible substrate and the target to form contamination, thus causing pinhole defects in the coating layer formed on the flexible substrate

[0005] At the same time, the take-up and unwinding rollers of the existing roll-to-roll vacuum magnetron coating equipment are located in the same coating vacuum chamber. During normal operation, the flexible substrate to be coated will release a large amount of impurity gas in the vacuum state during the unwinding process. Therefore, the working atmosphere and composition of the target in the coating vacuum chamber will have an adverse effect on the film layer.

[0006] In addition, in the existing roll-to-roll vacuum magnetron coating equipment, the positions of the take-up and unwind rolls and the cooling drum are limited. High film material is easy to cause defects such as "scratch" on the coated film layer

And because there is only one coating vacuum chamber, there is only one working vacuum atmosphere, and it is impossible to coat two or more layers with different requirements on the atmosphere at the same time.

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