Automatic liquid adding system for metal film stripping and cleaning device

Abstract

The invention relates to an automatic liquid adding system for a metal film stripping and cleaning device. The liquid adding system comprises an NMP soaking tank, an isopropanol supply pressure tank connected with a vacuum negative pressure liquid adding device, an acetone liquid supply pressure tank connected with a nitrogen positive pressure liquid supply device, and an NMP liquid supply pressure tank for supplying NMP liquids to the NMP soaking tank. A liquid adding inlet of the isopropanol liquid supply pressure tank is connected with a isopropanol liquid storage tank through a liquid adding pipe, a liquid adding inlet of the acetone liquid supply pressure tank is connected with a acetone liquid storage tank through a liquid adding pipe, and a liquid adding inlet of the NMP liquid supply pressure tank is connected with an NMP liquid storage tank through a liquid adding pipe. A liquid level detecting switch is disposed in each of the isopropanol supply pressure tank, the acetone liquid supply pressure tank, the NMP liquid supply pressure tank and the NMP soaking tank. By the automatic liquid adding system which is capable of unattended operation, operation efficiency of the system is increased evidently, automatic liquid adding is achieved, and equipment automation level is increased. In addition, the automatic liquid adding system is applicable to other full-automatic single-chip wet processing equipment.

Description

technical field [0001] The invention relates to the technical field of metal film peeling and cleaning equipment, in particular to an automatic liquid replenishment system for metal film peeling and cleaning equipment. Background technique [0002] In the semiconductor production process, the manufacture of surface acoustic wave (SAW) devices, GaAs microwave, millimeter wave devices, MEMS devices, OLED devices and advanced packaging and other fine patterns requires metal film stripping, rinsing and drying processes (see figure 1 ), the stripping line width can achieve CD=0.50um or more, which is the key process in the pre-manufacturing process of the above devices. [0003] At present, most domestic manufacturers use the manual stripping method, that is, soaking the wafer in the NMP chemical solution for a long time. Put the slices into a special measuring cup filled with acetone, use tweezers to pick up cotton and manually wipe and peel off, then wash, dry, and manually pe...

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to overcome the deficiencies of the above-mentioned technologies and provide an efficient, reliable and safe automatic liquid replenishment system for metal film peeling and cleaning equipment, so as to solve the need for equipment shutdown and meeting problems during the liquid replenishment process of the current manual or semi-automatic liquid replenishment methods. Technical problems causing harmful gas volatilization

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