Photoresist monomer, photoresist and their preparation method, color filter

A photoresist and monomer technology, which is applied in optical filters, optical mechanical equipment, sulfonate preparation, etc., can solve problems such as high hardness, light leakage, and large slope angle

Active Publication Date: 2015-09-09
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the fact that most photoresists will have a problem of high hardness after high-temperature hard-baking, the formed filter layer is not easy to bend and sink to form a slope, resulting in a large slope angle in the connection between the black matrix and the filter layer, which is easy causing light leakage

Method used

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  • Photoresist monomer, photoresist and their preparation method, color filter
  • Photoresist monomer, photoresist and their preparation method, color filter
  • Photoresist monomer, photoresist and their preparation method, color filter

Examples

Experimental program
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Effect test

preparation example Construction

[0091] Corresponding to the aforementioned photoresist monomer, the embodiment of the present invention also provides a method for preparing the photoresist monomer. by figure 1 As shown, specifically, the method includes the following steps:

[0092] Step S1: Set R 3 Substituted benzenesulfonyl chloride modified polyether polyol and R 2 The substituted acryloyl chloride is added to the reaction vessel.

[0093] In this step, weigh an appropriate amount of reactant R 3 Substituted benzenesulfonyl chloride modified polyether polyol, R 2 The substituted acryloyl chloride is added to the reaction vessel. Preferably, the R used in this step 3 Substituted benzenesulfonyl chloride modified polyether polyol, R 2 The weight part of the substituted acryloyl chloride is, R 3 Substituted benzenesulfonyl chloride modified polyether polyol: 1 part; R 2 Substituted acryloyl chloride: 2.3 to 6.1 parts.

[0094] Step S2: Add reaction solvent.

[0095] In this step, weigh an appropriate amount of rea...

Embodiment 1

[0116] Preparation of methyl substituted benzenesulfonyl chloride modified polyether triol:

[0117] 2 parts of polyether triol and 0.9 part of p-toluenesulfonyl chloride were dissolved in 100 parts of acetonitrile solvent, and stirred at room temperature for 2 hours. The insoluble matter was removed by filtration, and the pH of the filtrate was adjusted to 8.2 with a 10% hydrochloric acid solution, and a large amount of white precipitate was deposited. The precipitate was collected by filtration, recrystallized three times with water, and dried under vacuum at 50°C for 12 hours to obtain a methyl-substituted benzenesulfonyl chloride modified polyether triol.

[0118] Gel permeation chromatography was used to test methyl-substituted benzenesulfonyl chloride modified polyether triol, and its molecular weight was 8875.

[0119] Preparation of photoresist monomer A:

[0120] Add 1 part of methyl-substituted benzenesulfonyl chloride modified polyether triol and 2.3 parts of 2-methacryloy...

Embodiment 2

[0125] Preparation of polyether tetraol containing methyl substituted polyether chain modified by ethyl substituted benzenesulfonyl chloride:

[0126] 2 parts of polyether tetraol containing methyl substituted polyether chains and 0.8 part of p-ethylbenzenesulfonyl chloride are dissolved in 120 parts of acetonitrile solvent, and stirred for 2.5 hours at a constant temperature. The insoluble matter was removed by filtration, and the pH value of the solution was adjusted to 8.4 with 10% hydrochloric acid solution, and a large amount of white precipitate was deposited. The precipitate was collected by filtration, recrystallized three times with water, and dried under vacuum at 50°C for 12 hours to obtain an ethyl-substituted benzenesulfonyl chloride modified polyether tetraol containing methyl-substituted polyether chains.

[0127] Gel permeation chromatography was used to test an ethyl-substituted benzenesulfonyl chloride modified polyether tetraol containing methyl-substituted polye...

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Abstract

A photoresist monomer, a photoresist, preparation methods therefor, and a colour filter. The photoresist monomer has the structural formula I, where R1 is hydrogen or methyl; R2 is hydrogen, methyl, ethyl or propyl; R3 is H or C1 to C6 alkyl; and n = 1-4. The prepared photoresist has a compact and smooth surface and a flat angle of gradient.

Description

Technical field [0001] The present invention relates to the field of liquid crystal display, in particular to a photoresist monomer, photoresist and their preparation methods, and color filters. Background technique [0002] The color filter is a key component for the realization of color in the liquid crystal display. The manufacturing process is to first prepare a black matrix on the substrate, and then coat the photoresist on the substrate on which the black matrix is ​​formed. The photoresist is pre-baked, masked, and exposed. The exposed photoresist will cause The cross-linking reaction is retained in the subsequent lye development, and the retained pattern is washed, developed, and baked at high temperature to obtain a color filter. [0003] In the above-mentioned manufacturing process of manufacturing the black matrix and the filter layer, the edge portion of the filter layer is overlapped on the black matrix in the form of a slope to avoid light leakage. However, it is st...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08G65/00G03F7/004G02B5/20
CPCG03F7/004G02B5/201G03F7/027G03F7/0007C07C303/26C07C309/73G02B5/223G03F7/031
Inventor 王雪岚唐琛
Owner BOE TECH GRP CO LTD
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