Cleaning method used in amorphous carbon deposition process
A deposition process, amorphous carbon technology, applied in cleaning methods and utensils, chemical instruments and methods, metal material coating processes, etc. Coefficient of friction, effect of avoiding vane problems
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[0034] Attached below Figure 4 with 5 The specific implementation of the present invention will be further described in detail.
[0035] See Figure 4 , Figure 4 It is a schematic flow diagram of the cleaning process method in the amorphous carbon film deposition process of the present invention. Such as Figure 4 As shown, the cleaning method used in the amorphous carbon deposition process in the embodiment of the present invention includes a pre-cleaning process step S1 of the plasma cavity and a process step S2 of depositing an environmental protection film on the plasma cavity under plasma conditions.
[0036] It should be noted that in the pre-cleaning process step S1 of the plasma cavity under the plasma condition, the pre-cleaning process method in the PECVD amorphous carbon film deposition process can be used with the prior art. The cleaning method used in the amorphous carbon deposition process provided by the present invention is to improve the process step S2 of deposi...
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