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Process liquid supply apparatus operating method, and process liquid supply apparatus

A technology of a supply device and an operation method, which is applied to a device for coating a liquid on a surface, a separation method, a chemical apparatus and a method, etc., can solve the problems of the complicated formation process of the filter part, etc., and achieve shortened startup time and treatment liquid consumption. reduced effect

Active Publication Date: 2014-02-12
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Patent Document 2 discloses a method of reducing the number of air bubbles in the treatment liquid passing through the filter unit by giving features to the structure of the filter unit communicating with the treatment liquid discharge nozzle, but the feature of the filter unit is that the wall surface has periodic It is expected that the formation process of the filter part will be complicated

Method used

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  • Process liquid supply apparatus operating method, and process liquid supply apparatus
  • Process liquid supply apparatus operating method, and process liquid supply apparatus
  • Process liquid supply apparatus operating method, and process liquid supply apparatus

Examples

Experimental program
Comparison scheme
Effect test

comparative test A-1)

[0113] To study the relationship between the amount of liquid passing through the filter and the bubbles with a size of 100 nm or more per 1 mL of the chemical solution when the filter wetting process is performed only by positive pressure filtration of the chemical solution using the same device as in the evaluation test A-1 sex.

comparative test A-2)

[0115] To examine the relationship between the amount of liquid passing through the filter and the bubbles of 100 nm or larger in size per 1 mL of the chemical solution when the filter wetting process is performed only by negative pressure filtration of the chemical solution using the same device as in the evaluation test A-1 sex.

[0116] Among them, N in each experiment 2 Air pressure, filtration rate and other conditions are as follows:

[0117] ・Used medicinal solution: OK73 diluent (registered trademark, manufactured by Tokyo Ohka Co., Ltd.)

[0118] ·N 2 Air pressure (for positive pressure filtration): 50kPa

[0119] Filtration rate during negative pressure filtration: 0.5mL / sec

[0120] ・Amount of liquid passing through the filter per time during positive pressure filtration in evaluation tests A-1 and A-2: 40mL

[0121] ・Amount of liquid passing through the filter per time during negative pressure filtration in evaluation tests A-1 and A-2: 60mL

[0122] Figure 1...

comparative test B-1)

[0132] In the study, the same procedure was carried out using the same device as in comparative test A-1. After the number of bubbles per 1 mL of the drug solution became 0.1, a test was performed four times in which negative pressure filtration was repeated 100 times for 6 seconds at 0.5 mL / sec. The distribution of the amount of air bubbles with a size of 100 nm or more per 1 mL of the drug solution.

[0133] Figure 13 Indicates the result. In comparative test B-1, the main distribution can be seen in the part where the amount of bubbles is about 2 per 1 mL, while in evaluation tests B-1 and B-2, the distribution is around about 0.5. Since the distribution was partially seen, it was seen that the amount of air bubbles was reduced compared with the comparative test. In addition, regarding the number of observed air bubbles, statistical examination results confirmed that there is a difference between the evaluation test and the comparative test, which is not accidental (p<0....

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Abstract

According to an embodiment of the present disclosure, a process liquid supply apparatus operating method is provided. The method includes filling a filter unit with a process liquid from an upstream side of the filter unit to a downstream side of the filter unit after newly mounting or replacing the filter unit and repeating a depressurization filtering process and a pressurization filtering process for a predetermined number of times. The depressurization filtering process depressurizes the process liquid in the downstream side of the filter unit and thereby allows the process liquid to permeate through the filter unit. The pressurization filtering process pressurizes the process liquid from the upstream side of the filter unit and thereby allows the process liquid to permeate through the filter unit.

Description

technical field [0001] The present invention relates to an operation before starting treatment based on a treatment liquid in a treatment liquid supply device that discharges a treatment liquid from a nozzle through a filter unit. Background technique [0002] In the manufacturing process of a semiconductor device, chemical liquids such as a resist liquid, an acidic or alkaline cleaning liquid, a solvent, and a precursor-containing liquid for forming an insulating film are supplied from nozzles to perform liquid processing. Such a chemical solution supply device removes foreign matter by interposing a filter unit in the supply path. [0003] In these processes, air bubbles sometimes appear due to the dissolved gas in the resist or the chemical solution. However, as the line width of the pattern continues to be miniaturized, fine air bubbles that have not been a problem in the past are also forced to Requires attention. [0004] However, in an apparatus for applying these t...

Claims

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Application Information

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IPC IPC(8): B05C5/00B05C11/10H01L21/027B01D35/01
CPCH01L21/6715H01L21/67017H01L21/02008H01L21/02104H01L21/0273B01D19/0031B01D19/0036B01D36/001
Inventor 丸本洋高柳康治安达健二
Owner TOKYO ELECTRON LTD