Annealing method for raw material of power-integrated-circuit lead frame
An integrated circuit and lead frame technology, which is applied in the annealing field of power integrated circuit lead frame raw materials, can solve the problems of uneven and stable physical and mechanical properties of metal strips, unstable lead frame dimensions, and affecting product service life. Promote the use, easy to operate, prolong the effect of service life
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Embodiment 1
[0018] A method for annealing a raw material of a lead frame for a power integrated circuit, the steps of which are as follows: 1) first place the raw material of a lead frame for a power integrated circuit in an annealing device, heat it, and heat it to a low temperature region within 5 minutes and hours, that is, temperature control At 100°C, after 30-50 minutes of heat preservation, 2) continue heating, and quickly heat up to the high temperature area within 1 hour, that is, the temperature is controlled at 1000°C, and the heat preservation time is 2.5 hours. Lower to the middle temperature area, that is, the temperature is controlled at 500°C, and the temperature drops to room temperature within 2 hours, that is, 15°C. 4) Cool the raw material again through water mist. When the temperature is controlled at 5°C, exit the annealing device, and the whole Nitrogen or inert gas is always used as a protective gas during annealing.
Embodiment 2
[0020] As a further improvement of the present invention, a method for annealing raw materials of power integrated circuit lead frames, the steps of the method are as follows: 1) First, place the raw materials of power integrated circuit lead frames in an annealing device, heat them, and heat them within 10 minutes To the low temperature area, that is, the temperature is controlled at 150°C, and after 50 minutes of heat preservation, 2) continue heating, and the temperature rises rapidly to the high temperature area within 2 hours, that is, the temperature is controlled at 1300°C, and the heat preservation time is 3.5 hours. Cooling down to the medium temperature area within 30 minutes, that is, the temperature is controlled at 600°C, and the temperature is reduced to room temperature within 3 hours, that is, 25°C. 4) Cool the raw materials again through water mist. When the temperature is controlled at 13°C, Exit the annealing device, and use nitrogen or inert gas as the prote...
Embodiment 3
[0022] As a further improvement of the present invention, the steps of the method are as follows: 1) First, put the raw material of the power integrated circuit lead frame in the annealing device, and heat it, and heat it to a low temperature area within 8 minutes, that is, the temperature is controlled at 125°C, and the heat preservation After 40 minutes, 2) continue heating, and rapidly rise to the high temperature area within 1 hour, that is, the temperature is controlled at 1200°C, and the holding time is 3 hours. The temperature is controlled at 550°C, and the temperature drops to room temperature within 2.5 hours, that is, 20°C. 4) Cool the raw material again through water mist. When the temperature is controlled at 10°C, exit the annealing device. During the entire annealing process, nitrogen or Inert gas is used as shielding gas.
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Abstract
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