Photo-etching machine and non-contact type leveling and focusing system and method thereof
A non-contact technology for leveling and focusing, applied in the direction of optomechanical equipment, optics, instruments, etc., can solve the problems of complex structure of non-contact focusing and leveling devices, and achieve system complexity reduction, accurate gap measurement and Feedback control, low cost effect
Active Publication Date: 2014-03-12
成都频泰医疗设备有限公司
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[0004] The purpose of the present invention is to propose a non-contact lithography machine leveling and focusing system, method and lithography system with a simple and compact system structure, which is easy to implement, in view of the complicated structure of the non-contact focusing and leveling device in the field of lithography machines. machine
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[0024] figure 1 It is a schematic diagram of the leveling and focusing system of the non-contact lithography machine of the present invention. In this embodiment, three spectral confocal displacement sensors are taken as an example for illustration. The leveling and focusing system of the non-contact lithography machine includes three The three spectral confocal displacement sensors (101, 102, 103) are located above the mask plate 4 and distributed in a triangle on the same plane. There is a certain distance between the lower end of the spectral confocal displacement sensor (101, 102, 103) and the mask plate 4, and the distance between the lower surface of the mask plate 4 and the lower end of the spectral confocal displacement sensor (101, 102, 103) should be Greater than the shortest range of the spectral confocal displacement sensor, so that the distance between the lower surface of the mask 4 and the photoresist layer 5 on the surface of the sample 6 is within the range o...
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The invention discloses a non-contact type leveling and focusing system of a photo-etching machine. The non-contact type leveling and focusing system of the photo-etching machine comprises at least three spectrum confocal displacement sensors and a signal processing circuit, wherein the spectrum confocal displacement sensors are used for acquiring data of a space distance between the lower surface of a mask plate of the photo-etching machine and the upper surface of a photoresist layer which is located on the surface of a sample wafer on the photo-etching machine; the signal processing circuit is used for calculating according to the data of the space distance acquired by the spectrum confocal displacement sensors, outputting a control signal to a wafer bearing mechanism and a lifting mechanism of the photo-etching machine, performing leveling and focusing control on the sample wafer, and maintaining the space distance between the upper surface of the photoresist layer on the surface of the sample wafer and the lower surface of the mask plate within a predetermined working distance. The invention also discloses a non-contact type leveling and focusing method of the photo-etching machine and the photo-etching machine comprising the leveling and focusing system. According to the non-contact type leveling and focusing system of the photo-etching machine, complex optical structure parts in a current non-contact type leveling and focusing device are replaced, and the complexity is reduced, so that the non-contact type leveling and focusing system of the photo-etching machine is easy to implement.
Description
technical field [0001] The invention relates to the technical field of micro-optics and micro-electronics equipment, in particular to non-contact and accurate measurement of the gap between a mask plate and a sample on a workpiece table of a proximity lithography machine by using a spectral confocal displacement sensor to realize the functions of leveling and focusing. Contact lithography machine leveling and focusing system, method and lithography machine. Background technique [0002] The photolithography machine is an essential and important manufacturing equipment in the microelectronics and micro-optic industries at present, and it is necessary to achieve precise leveling and maintain a certain gap between the mask plate and the photoresist-coated sample. An important guarantee for the high-quality reproduction of plate patterns on samples. The basic principle of the current close-contact focusing and leveling device is to use the lifting mechanism to raise the sample ...
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IPC IPC(8): G03F7/207
Inventor 杨若夫敖明武
Owner 成都频泰医疗设备有限公司