An online controllable optical element etching device

Abstract

The invention discloses an online controllable optical component etching device, and relates to optical component etching devices. The online controllable optical component etching device is equipped with buffer solution storage containers, an etching reaction generation device, a servo motor, a sealing cover, a rotary multifunctional clamp, an online concentration meter and a constant temperature box, wherein the different buffer solution storage containers are filled with different etching solutions; the lower ends of the buffer solution storage containers are connected with the sealing cover via guide pipes; the guide pipes are directly introduced in the etching reaction generation device; switches are arranged at the middle parts of the guide pipes; the servo motor is mounted at the middle part of the sealing cover and connected with a central shaft of the rotary multifunctional clamp; the online concentration meter is arranged at the outer lower end of the etching reaction generation device; the rotary multifunctional clamp achieves the fixation of optic components and the agitation of the etching solutions and is equipped with the vertical central shaft and four pairs of transverse branches, optical component positioning grooves are formed in the four pairs of transverse branches, and four groove branches are formed in the vertical central shaft; one ends of each pair of transverse branches extend into the groove branches, and the other transverse branch of the each pair of transverse branches longitudinally moves along one groove branch.

Description

technical field [0001] The invention relates to an optical element etching device, in particular to an online controllable optical element etching device which can realize real-time control of the concentration of etching solution and ensure uniform concentration and constant temperature during the optical element etching process. Background technique [0002] In the application and development of modern laser technology, the subsurface damage formed in the manufacturing process of optical components is one of the main causes of laser damage. Quantitative determination of the depth and distribution of subsurface damage in optical materials is of great importance for the study of its damage formation mechanism, Optimizing processing parameters plays an extremely important role (Li Gailing, Wu Yulie, Wang Zhuo. Experimental research on destructive measurement technology for subsurface damage depth of optical materials[J]. Aeronautical Precision Manufacturing Technology, 2006,42...

AI Technical Summary

Problems solved by technology

The existing experimental equipment is difficult to meet the experimental requirements. Since the main component of the optical element etching solution is hydrofluoric acid, hydrofluoric acid is extremely volatile and it is difficult to ensure that the concentration of its aqueous solution is uniform everywhere, resulting in uneven etching of the optical element after etching. Experimental data errors are serious

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