Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Sludge lentinus edodes residue growing media suitable for growth of Chinese pine and preparation method of sludge lentinus edodes residue growing media

A technology for cultivating substrates and shiitake mushrooms, which is applied in the field of cultivating substrates of shiitake mushroom residues with sludge, can solve the problems of less nutrient components, poor water retention, waste of resources and the like, and achieves the effects of improving nutritional effects, creating social and economic benefits, and creating economic benefits.

Inactive Publication Date: 2014-04-30
HEBEI ACAD OF FORESTRY SCI
View PDF3 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the embodiments of the present invention is to provide a kind of sludge mushroom dregs cultivation substrate suitable for the growth of Pinus tabulaeformis and its method, aiming to solve the problem of high cost, low nutritional content, poor water retention and serious waste of resources in traditional Chinese pine growth cultivation substrates The problem

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sludge lentinus edodes residue growing media suitable for growth of Chinese pine and preparation method of sludge lentinus edodes residue growing media
  • Sludge lentinus edodes residue growing media suitable for growth of Chinese pine and preparation method of sludge lentinus edodes residue growing media
  • Sludge lentinus edodes residue growing media suitable for growth of Chinese pine and preparation method of sludge lentinus edodes residue growing media

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0015] In order to make the object, technical solution and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the examples. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0016] The application principle of the present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0017] Such as figure 1 As shown, a kind of sludge mushroom dregs cultivation substrate suitable for the growth of Pinus tabulaeformis. 0.5mm-2mm and 2mm-5mm, compounded according to the ratio of 1:1, the sludge is a powder with a particle size of <0.5mm, mixed with mushroom slag according to the mass ratio of sludge content of 20.0%, and made Sludge mushroom slag cultivation substrate suitable for the growth of Pinus tabulaeformis.

[0018] Further, the sludg...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a sludge lentinus edodes residue growing media suitable for the growth of a Chinese pine and a preparation method of the sludge lentinus edodes residue growing media. The sludge lentinus edodes residue growing media is prepared from lentinus edodes residues and sludge, wherein the lentinus edodes residues are a mixture containing sawdust, wheat bran and starch accounting for 90 percent of the mixture and are sieved into particles with the particle size respectively of 0.5-2mm and 2-5mm, and the particles are compounded according to the ratio of 1:1; and the sludge is a powder with the particle size smaller than 0.5mm; and the sludge with the mass percentage of 20.0% is mixed with the lentinus edodes residues. The preparation method comprises the following steps: removing impurities, sieving compounding, sieving out the sludge powder, weighing and mixing according to the ratio and packaging. By adopting the sludge lentinus edodes residue growing media, nutritional ingredients such as moisture, mineral substances and the like needed in the seedling growing process of the Chinese pine are strengthened, and the function of water retention is fulfilled; and as the sludge and the lentinus edodes residues are effectively combined and utilized, the waste materials can be utilized to create economic benefit, the media problem of the Chinese pine in the seedling growing and production process can also be solved, and the cost is lowered.

Description

technical field [0001] The invention belongs to the technical field of the growth and cultivation substrate of Chinese pine, and in particular relates to a sludge mushroom dregs cultivation substrate suitable for the growth of Chinese pine and a method thereof. Background technique [0002] As agricultural production waste, shiitake mushroom residue not only wastes resources but also takes up a lot of space due to slow natural degradation. Using shiitake mushroom residue as a cultivation substrate can not only make full use of resources, but also create certain economic value. However, the direct use of shiitake mushroom dregs will require frequent watering due to poor water retention, and nutrients need to be supplemented during plant growth, which will bring corresponding troubles to cultivation and production. Due to the high content of organic matter and colloid, the sludge cannot be used directly as a substrate. By mixing the two and finding the content of mushroom resi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C05F15/00
Inventor 毕君武亚敬髙红真
Owner HEBEI ACAD OF FORESTRY SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products