A copper-clad circuit board etching process
A circuit board and copper clad laminate technology, applied in the field of copper clad circuit board etching process, can solve the problems of unenvironmental protection, increased processing cost, increased circuit board production cost, etc., and achieves the effect of low production cost and improved precision
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Embodiment 1
[0026] After the film-coated, exposed, and developed copper-clad laminates are washed with reverse osmosis water, they are placed in a 2m-long needle brush grinder for physical micro-etching for 20s, and then put into a 2m-long needle brush Physical micro-etching is carried out in the brush grinding machine, and at the same time, the aqueous solution containing 3% sulfuric acid and 3% hydrogen peroxide is evenly sprayed on the upper and lower surfaces of the copper clad laminate for 20s, and then enters the needle brush type with a length of 2m. Perform physical microetching in the grinding machine for 20s. Then wash its surface to neutral with RO water, and immerse it in NH with a copper ion concentration of 120g / L. 4 Soak in the mixed aqueous solution of Cl and ammonia water for 2min at 32°C, and finally wash with RO water until neutral. Remove the film of the etched copper clad laminate for section observation, there is no copper wire bridging phenomenon, the edge of the e...
Embodiment 2
[0028] After the film-coated, exposed, and developed copper-clad laminates are first washed with reverse osmosis water, they are put into a 2.2m-long needle brush grinding machine for physical micro-etching for 18s, and then into a 2.2m-long Physical micro-etching is carried out in a needle brush grinding machine, and at the same time, the aqueous solution containing 3% sulfuric acid and 3% hydrogen peroxide is evenly sprayed on the upper and lower surfaces of the copper clad laminate for 18s, and then enters the length of 2.2m. Physical microetching was carried out in a needle brush grinding machine for 18s. Then wash its surface with RO water to neutral, and immerse it in NH with a copper ion concentration of 140g / L. 4 Soak in the mixed aqueous solution of Cl and ammonia water for 1.5min at 30°C, and finally wash with RO water until neutral. Remove the film of the etched copper clad laminate for section observation, no copper wire bridging phenomenon, the edge of the etched...
Embodiment 3
[0030] After the film-coated, exposed, and developed copper-clad laminates are first washed with reverse osmosis water, they are placed in a pin brush grinder with a length of 1.8m for physical micro-etching for 23s, and then into a 1.8m-long Physical micro-etching is carried out in a needle brush grinding machine, and at the same time, the aqueous solution containing 3% sulfuric acid and 3% hydrogen peroxide is evenly sprayed on the upper and lower surfaces of the copper clad laminate for 23s, and then enters the length of 2.2m. Perform physical micro-etching in a needle brush grinder for 23s. Then wash its surface with RO water to neutral, and immerse it in NH with a copper ion concentration of 100g / L. 4 Soak in the mixed aqueous solution of Cl and ammonia water for 1.5min at 35°C, and finally wash with RO water until neutral. Remove the film of the etched copper clad laminate for section observation, no copper wire bridging phenomenon, the edge of the etched copper wire is...
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