A kind of alticrn/yn nanometer multi-layer hard coating and preparation method thereof
A hard coating, nano-multi-layer technology, applied in coatings, chemical instruments and methods, metal material coating technology, etc., can solve the problem that the high-temperature performance advantages of TiAlCrYN coatings have not been fully utilized, and the effect of enhanced bonding is not obvious , Unfavorable oxidation resistance and other issues, to achieve the effect of excellent high temperature oxidation resistance, easy implementation, high hardness
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Embodiment 1
[0033] Clean the hard alloy turning tool with the conventional method, put it into the coating chamber after drying, and evacuate to 6.0×10 -3 Pa, and then argon gas is introduced into the coating chamber, and the pressure is controlled at 3.5×10 -1 Pa, turn on the hot cathode ion column arc so that the current is 160A, use the electrons generated by it to bombard the tool substrate for heating, and the time is 80min; adjust the flow of argon to make the pressure 1.5×10 -1 Pa, under the condition of applying -100V DC bias voltage and -350V pulse bias voltage to the tool at the same time, etch and clean for 15min; adjust the pressure to 1.1×10 -1 Pa, and the current of the hot cathode ion column arc is adjusted to 200A, so that the pure Ti metal in the crucible is melted and evaporated, and the tool substrate is plated for 10 minutes to deposit a layer of Ti bonding layer on the surface; 3.8×10 -1 Pa, the nitrogen-argon partial pressure ratio is 0.45, and the current of the h...
Embodiment 2
[0036] Clean the cemented carbide milling cutter with the conventional method, put it into the coating chamber after drying, and evacuate to 6.0×10 -3 Pa, and then argon gas is introduced into the coating chamber, and the pressure is controlled at 3.6×10 -1 Pa, turn on the hot cathode ion column arc so that the current is 140A, use the electrons generated by it to bombard the tool substrate for heating, and the time is 70min; adjust the flow of argon to make the pressure 2.1×10 -1 Pa, under the condition of applying -100V DC bias and -200V pulse bias to the tool at the same time, etch and clean for 18min; adjust the pressure to 1.0×10 -1 Pa, and the current of the hot cathode ion column arc is adjusted to 180A, so that the pure Cr metal in the crucible is melted and evaporated, and the tool substrate is plated for 8 minutes to deposit a layer of Cr bonding layer on the surface; 3.0×10 -1 Pa, the nitrogen-argon partial pressure ratio is 0.25, and the current of the hot cathod...
Embodiment 3
[0039] Clean the high-speed steel taps by conventional methods, put them into the coating chamber after drying, and vacuumize to 6.0×10 -3 Pa, and then argon gas is introduced into the coating chamber, and the pressure is controlled at 4.0×10 -1 Pa, turn on the hot cathode ion column arc so that the current is 165A, use the electrons generated by it to bombard the tool substrate for heating, and the time is 50min; adjust the flow of argon to make the pressure 2.0×10 -1 Pa, under the condition of applying -180V DC bias voltage and -300V pulse bias voltage to the tool at the same time, etch and clean for 60min; adjust the pressure to 1.2×10 -1 Pa, and the current of the hot cathode ion column arc is adjusted to 202A, so that the pure Ti metal in the crucible is melted and evaporated, and the tool substrate is plated for 10 minutes to deposit a layer of Ti bonding layer on the surface; 4.0×10 -1 Pa, the nitrogen-argon partial pressure ratio is 0.4, and the current of the hot ca...
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