A Control System Structure for Functional Adjustment of Photolithography Projection Objective Lens

Abstract

The invention provides a structure of a control system for the functional adjustment of a photoetching projection objective lens, and belongs to the field of control on the photoetching projection objective lens. The invention aims to solve the problems that thermal power generated by a piezoelectric actuator influences the imaging quality and a capacitive sensor cannot carry out long-distance transmission and is long in adjustment time in the prior art. The structure of the control system for the functional adjustment of the photoetching projection objective lens comprises a control case, a power amplification case, a level switching case, a piezoelectric actuator and a capacitive sensor, wherein an optical fiber communication board card of the control case is connected with a core algorithm board card of the power amplification case by an optical fiber transmission chain; a driving collection board card of the power amplification case is connected with an analogue-digital conversion board card of the level switching case by a digital signal conversion chain; the driving collection board card of the power amplification case is connected with the piezoelectric actuator through a high-voltage analogue signal transmission chain; the analogue-digital conversion board card of the level switching case is connected with the capacitive sensor through a low-voltage simulation signal transmission chain; the piezoelectric actuator and the capacitive sensor are arranged on the photoetching projection objective lens.

Description

technical field [0001] The invention belongs to the field of photolithographic projection objective lens control, and in particular relates to a control system structure for functional adjustment of a photolithographic projection objective lens. Background technique [0002] The lithography projection objective lens is an ultra-precision optical system. Functional adjustment is the main method used to compensate for the image quality degradation caused by environmental changes in the lithography projection objective lens. The adjustment time of the functional adjustment is two times of instantaneous field of view exposure. The time interval is usually 0.1s-0.2s to ensure the output of the lithography machine. Functional adjustment can be realized by using a piezoelectric driver to drive the image quality sensitive lens and using a capacitive sensor as position feedback. However, the piezoelectric driver needs to be driven by a high-voltage drive. If it is placed around the o...

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to propose a control system structure for the functional adjustment of the lithographic projection objective lens, so as to solve the problems in the prior art that the thermal power generated by the piezoelectric driver affects the imaging quality, and the capacitive sensor cannot perform long-distance transmission and long adjustment time.

Images