Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Clostridium beijerinckii with high stress resistance and application thereof

A Clostridium beijerinckii, inverse technology, applied in the field of genetic engineering and fermentation engineering, can solve the problems of complex inhibition mechanism and unclear inhibition mechanism, and achieve the goal of improving stress resistance, high efficiency stress resistance, and high butanol production Effect

Inactive Publication Date: 2014-07-09
GUANGDONG PROVINCIAL BIOENGINEERING INST (GUANGZHOU SUGARCANE IND RES INST)
View PDF2 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the inhibitory mechanism of phenolic compounds on microbial growth and fermentation is relatively complex, and its inhibitory mechanism is still unclear.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Clostridium beijerinckii with high stress resistance and application thereof
  • Clostridium beijerinckii with high stress resistance and application thereof
  • Clostridium beijerinckii with high stress resistance and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] 1. Construction of Clostridium beijerinckii Cbei_3304 gene insertion inactivation mutant strain

[0023] The principle of constructing Clostridium beijerinckii Cbei_3304 gene insertion inactivation mutant strain is as follows figure 2 As shown, the specific construction process includes the following steps:

[0024] (1) Construction of Cbei_3304 insertion inactivation vector

[0025] 1) Design introns

[0026] According to the Cbei_3304 gene sequence of Clostridium beijerinckii included in the NCBI database (as shown in SEQ ID No: 1), the appropriate insertion gene site was designed with the help of software ( http: / / www.clostron.com ), select the insertion between bases 101-102, and generate an intron sequence, synthesize the intron sequence S-101 (its sequence is shown in SEQ ID NO: 2), and design the following primers.

[0027] Cloning primers:

[0028] pWJ-OSC-101-S: 5'-ggagtgtcgaggatc ctcgag ataattatccttacacttcgcc-3', its sequence is shown in SEQ ID NO:...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses clostridium beijerinckii with high stress resistance and an application of the clostridium beijerinckii. A gene Cbei_3304 of the clostridium beijerinckii strain with high stress resistance cannot be expressed normally, and a normal Cbei_3304 protein function is deleted, so that the clostridium beijerinckii has high stress resistance to toxic substances such as ferulic acid and vanillic acid, also has high stress resistance to toxic substances in virus-carrying wood fiber acidolysis sugar liquor, and can be used for producing butyl alcohol through fermentation very well. The invention provides a simple and efficient method for improving stress resistance of the clostridium beijerinckii. The clostridium beijerinckii which has high stress resistance to the toxic substances in the virus-carrying wood fiber acidolysis sugar liquor and can be used for efficiently producing butyl alcohol can be obtained by only enabling the clostridium beijerinckii to delete the normal Cbei_3304 protein function, so as to be helpful in promoting the efficient utilization of wood fiber resources.

Description

technical field [0001] The invention relates to a highly stress-resistant Clostridium beijerinckii and its application, belonging to the technical fields of genetic engineering and fermentation engineering. Background technique [0002] With the depletion of fossil energy, the use of renewable lignocellulosic raw materials (such as corncobs, bagasse, etc.) to produce bioenergy and biobased chemicals through microbial fermentation has become one of the focus and hotspots of research. Lignocellulosic raw materials must be pretreated to obtain sugars fermentable by microorganisms, so that they can be well utilized by microorganisms. However, after lignocellulosic raw materials are pretreated, inhibitors such as organic acids, furfural, and phenols will be produced. The removal of these inhibitors is costly and has a certain inhibitory effect on microbial growth. Therefore, it is particularly important to improve the stress resistance of microorganisms. [0003] Butanol has th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C12N1/20C12P7/16C12R1/145
CPCC12N1/20C12N1/22C12P7/16C12N1/205C12R2001/145Y02E50/10
Inventor 郭亭梁达奉张九花蚁细苗谭文兴黄玉南李雨虹钟映萍
Owner GUANGDONG PROVINCIAL BIOENGINEERING INST (GUANGZHOU SUGARCANE IND RES INST)
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com