Micro polaroid array on basis of metal nanometer optical gratings and preparation method thereof

A technology of micro-polarizer array and metal nanometers, which is applied in the direction of polarizing elements, optical mechanical equipment, and photoplate-making process of pattern surface, etc., can solve the problems of increasing production cost, low transmittance, and reducing the consistency of process parameters, etc., to achieve The effect of reducing production costs and simplifying the process

Active Publication Date: 2014-08-06
UNIV OF SCI & TECH OF CHINA
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Problems solved by technology

This method needs to make two layers of metal nanowire grating arrays successively on one surface, such as figure 1 As shown in a, to achieve four different polarization directions, it is necessary to fabricate four layers of metal nanowire grating arrays, such as figure 1 As shown in b, the manufacturing process of the four-layer metal nanowire grating array is to make a multi-layer micro-polarizer array, and each polarization direction is one layer, which brings two problems: one, the repeated engraving of the silicon dioxide layer Etching and deposition will reduce the transmittance of the required light, and the more the number of layers, the lower the transmittance; second, polarizers with different polarization directions are on different layers, which will reduce the consistency of process parameters, resulting in different polarization directions. Dispersed performance; Third, multiple deposition of aluminum layer and silicon dioxide layer will increase the complexity of the process, reduce the yield and increase the production cost

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  • Micro polaroid array on basis of metal nanometer optical gratings and preparation method thereof
  • Micro polaroid array on basis of metal nanometer optical gratings and preparation method thereof
  • Micro polaroid array on basis of metal nanometer optical gratings and preparation method thereof

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preparation example Construction

[0028] According to another aspect of the present invention, propose a kind of preparation method based on the single-layer micro-polarizer array of metal nano grating, such as Figure 4 Shown, this preparation method comprises the following steps:

[0029] Step 1. Carry out double-sided polishing and cleaning on the high-transmittance substrate. The substrate material is generally selected from materials with good transmission properties for light in the working band, such as glass or sapphire, and then electron beam deposition, chemical vapor deposition and The spin-coating method sequentially coats an aluminum layer, a silicon dioxide layer and a negative photoresist layer on the base material, wherein silicon dioxide is used as a hard template to etch the metal layer, such as Figure 4 as shown in a;

[0030] Step 2, use a laser to generate two beams of light for interference, and the generated interference fringes expose the photoresist, then turn off the interference li...

Embodiment 1

[0037] Embodiment 1, a micro-polarizer array with four polarization transmission directions was prepared according to the above method. The specific process is as follows:

[0038] Step 1. Using the glass substrate as the base material, optimize the glass surface through the mechanical chemical polishing (CMP) process, so that the fluctuation of the glass surface in the area of ​​3cm×3cm is within + / -5nm, and soak the glass sample in isopropanol and acetone in turn Cleaning, the sample is then placed in a reactive ion etching device, and further cleaned with oxygen by reactive ion etching, wherein the etching power is 300W, and the time is 20 minutes;

[0039] Step 2. Electron beam deposition and chemical vapor deposition are used to plate 140nm aluminum and 20nm silicon dioxide on the surface of the sample, and the silicon dioxide is used as a hard template to etch the aluminum layer;

[0040] Step 3. Spin-coat the negative photoresist onto the sample. The negative photoresi...

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Abstract

The invention discloses a micro polaroid array on basis of metal nanometer optical gratings and a preparation method thereof. The single-layer micro polaroid array comprises a substrate with high light-admitting quality and the metal nanometer optical gratings on the substrate, wherein the arrangement directions of the metal nanometer optical gratings on the substrate are not identical, one optical grating formed by adjacent metal nanowires which are arranged in the same direction is a micro Polaroid, and the size of each micro polaroid is equal to the pixel size of a photosensitive element chip. Meanwhile, the invention further discloses a preparation method for the single-layer micro polaroid array on the basis of the metal nanometer optical gratings. Accordingly, micro polaroid arrays in different polarization directions can be integrated to the same layer, the problem that light transmittance needed by a micro polaroid array based on multi-layer metal optical gratings in the prior art is not high is solved, the technological processes are simplified, and manufacturing cost is reduced.

Description

technical field [0001] The invention relates to the technical field of micro-polarizer arrays, in particular to a brand-new single-layer micro-polarizer array and its preparation method. Its pixel size and pixel array are matched with the image sensor CCD used, and can be imaged in one exposure. Extract and analyze image information of light intensity and polarization of incident light with arbitrary polarization state, and can perform real-time phase shift analysis. Background technique [0002] The micropolarizer array is a device used to measure the light intensity of each polarization direction after the light passes through the polarizers with different transmission directions. It is usually used in conjunction with an image sensor (such as a digital camera) to obtain the The obtained images of each polarization component can be analyzed in real time. At present, the preparation methods of micropolarizer arrays mainly include polyvinyl alcohol film etching, liquid crys...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/28G02B5/30G03F7/00
CPCG02B5/30G03F7/0005
Inventor 张青川张志刚赵旸程腾伍小平
Owner UNIV OF SCI & TECH OF CHINA
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