Micro-polarizer array based on metal nano-grating and its preparation method

一种微偏振片阵列、金属纳米的技术,应用在偏振元件、光机械设备、图纹面的照相制版工艺等方向,能够解决增加制作成本、透射率低、降低所需光线透过率等问题,达到降低制作成本、简化工艺流程的效果

Inactive Publication Date: 2017-05-03
UNIV OF SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This method needs to make two layers of metal nanowire grating arrays successively on one surface, such as figure 1 As shown in a, to achieve four different polarization directions, it is necessary to fabricate four layers of metal nanowire grating arrays, such as figure 1 As shown in b, the manufacturing process of the four-layer metal nanowire grating array is to make a multi-layer micro-polarizer array, and each polarization direction is one layer, which brings two problems: one, the repeated engraving of the silicon dioxide layer Etching and deposition will reduce the transmittance of the required light, and the more the number of layers, the lower the transmittance; second, polarizers with different polarization directions are on different layers, which will reduce the consistency of process parameters, resulting in different polarization directions. Dispersed performance; Third, multiple deposition of aluminum layer and silicon dioxide layer will increase the complexity of the process, reduce the yield and increase the production cost

Method used

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  • Micro-polarizer array based on metal nano-grating and its preparation method
  • Micro-polarizer array based on metal nano-grating and its preparation method
  • Micro-polarizer array based on metal nano-grating and its preparation method

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preparation example Construction

[0028] According to another aspect of the present invention, a method for preparing a single-layer micro-polarizer array based on a metal nanograting is provided, such as Figure 4 As shown, the preparation method includes the following steps:

[0029] Step 1. Perform double-sided polishing and cleaning on the substrate with high light transmittance. The substrate material is generally selected from materials with good transmission performance for light in the working band, such as glass or sapphire, and then electron beam deposition, chemical vapor deposition and chemical vapor deposition are used respectively. The spin coating method sequentially deposits an aluminum layer, a silicon dioxide layer and a negative photoresist layer on the base material. Among them, silicon dioxide is used as a hard template to etch the metal layer, such as Figure 4 shown in a;

[0030] Step 2. Use a laser to generate two beams of light to interfere, and the generated interference fringes expose t...

Embodiment 1

[0037] In the first embodiment, a micro-polarizer array with four polarization transmission directions is prepared according to the above method. The specific process is as follows:

[0038] Step 1. Use the glass substrate as the base material, optimize the glass surface through the mechanical chemical polishing (CMP) process, so that the fluctuation of the glass surface in the 3cm×3cm area is + / -5nm, and the glass sample is sequentially immersed in isopropanol and acetone Cleaning, the sample is then placed in a reactive ion etching device, and further cleaned with oxygen by reactive ion etching, wherein the etching power is 300W and the time is 20 minutes;

[0039] Step 2. Electron beam deposition and chemical vapor deposition are respectively used to plate 140nm aluminum and 20nm silicon dioxide on the surface of the sample. The silicon dioxide is used as a hard template to etch the aluminum layer;

[0040] Step 3. Spin-coat the negative photoresist onto the sample. The negative ...

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Abstract

The invention discloses a micro polaroid array on basis of metal nanometer optical gratings and a preparation method thereof. The single-layer micro polaroid array comprises a substrate with high light-admitting quality and the metal nanometer optical gratings on the substrate, wherein the arrangement directions of the metal nanometer optical gratings on the substrate are not identical, one optical grating formed by adjacent metal nanowires which are arranged in the same direction is a micro Polaroid, and the size of each micro polaroid is equal to the pixel size of a photosensitive element chip. Meanwhile, the invention further discloses a preparation method for the single-layer micro polaroid array on the basis of the metal nanometer optical gratings. Accordingly, micro polaroid arrays in different polarization directions can be integrated to the same layer, the problem that light transmittance needed by a micro polaroid array based on multi-layer metal optical gratings in the prior art is not high is solved, the technological processes are simplified, and manufacturing cost is reduced.

Description

Technical field [0001] The invention relates to the technical field of micro-polarizer arrays, in particular to a brand-new single-layer micro-polarizer array and a preparation method thereof. Its pixel size and pixel array are matched with the image sensor CCD used, and can be imaged in one exposure. Extract and analyze the image information of the intensity and polarization of incident light with any polarization state, and perform real-time phase shift analysis. Background technique [0002] The micro-polarizer array is a device used to measure the light intensity of each polarization direction after the light passes through the polarizers with different transmission directions. It is usually used in conjunction with an image sensor (such as a digital camera) to obtain the measurement result from the micro-polarizer array. The obtained images of each polarization component can be analyzed in real time. At present, the preparation methods of micro-polarizer arrays mainly inclu...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B27/28G02B5/30G03F7/00
CPCG02B5/30G03F7/0005
Inventor 张青川张志刚赵旸程腾伍小平
Owner UNIV OF SCI & TECH OF CHINA
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